2011
DOI: 10.1016/j.tsf.2011.04.043
|View full text |Cite
|
Sign up to set email alerts
|

Rapid thermal-plasma annealing of ZnO:Al films for silicon thin-film solar cells

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
17
0

Year Published

2011
2011
2018
2018

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 22 publications
(18 citation statements)
references
References 32 publications
0
17
0
Order By: Relevance
“…Therefore, the research in this field (the influence of the growth parameters, and subsequent heat treatment on the properties and the stability of the films) is intensively conducted [19][20][21][22]. Al/ZnO is easy to fabricate with various deposition methods, e.g.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Therefore, the research in this field (the influence of the growth parameters, and subsequent heat treatment on the properties and the stability of the films) is intensively conducted [19][20][21][22]. Al/ZnO is easy to fabricate with various deposition methods, e.g.…”
Section: Introductionmentioning
confidence: 99%
“…Al/ZnO is easy to fabricate with various deposition methods, e.g. thermal evaporation [17], chemical vapour deposition (CVD) [18], plasma-enhanced chemical vapour deposition (PECVD) [19], sol-gel [20], spray pyrolysis [21], and magnetron sputtering [22,23]. Among sputtering methods, continuous direct current (dc) magnetron sputtering is the simplest and has many advantages such as a higher deposition rate and an easier operation than radio frequency magnetron sputtering.…”
Section: Introductionmentioning
confidence: 99%
“…Other mechanisms, such as reduction of point defects and activation of the Al from Al-oxide phase 36,37 are also possible and should not be disregarded. For example, Kim et al 37 showed activation of Al dopants through deoxidation of Aloxides, after annealing ZnO:Al films at 900 C for 3 mins.…”
mentioning
confidence: 99%
“…ZnO thin films have many advantages: high chemical and mechanical stability, nontoxic in nature, high abundance, and transparency over other oxide thin films like ITO, CdO, SnO 2 , etc. ZnO is used as transparent conductive oxide (TCO) thin films, mainly in solar cells (Ohta et al 2011), heat mirrors, and organic light emitting diodes (Gong et al 2010;Yoo et al 2008). It can also be used as piezo electric devices and gas sensors (Kang and Joung 2007;Ferro 2009).…”
Section: Introductionmentioning
confidence: 99%