Rapid thermal processing technology for the 21st century

Timans, P. J.

doi:10.1016/s1369-8001(98)00031-6

Cited by 27 publications

(11 citation statements)

References 19 publications

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“…Compared to this work, it reveals that the maximum water CA (83°) of carbon films annealed by RTA is larger than that by CTA. Besides, RTA presents advantages in temperature control, ambient purity, cycle time, and process flexibility 22. Furthermore, CTA can only be executed by a batch process, nevertheless, RTA can be executed by the continuous process due to its short cycle time.…”

Section: Resultsmentioning

confidence: 99%

“…Recently, the characteristics of carbon films on optical fibers were improved by conventional thermal annealing (CTA) 21. In comparison to CTA, where large batches of wafers are loaded into tube furnaces, rapid thermal annealing (RTA) presents advantages in temperature control, ambient purity, cycle time, and process flexibility 22. However, no work was found to improve the properties of carbon coatings on optical fibers by RTA.…”

Section: Introductionmentioning

confidence: 99%

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The effect of rapid thermal annealing on characteristics of carbon coatings on optical fibers

Chen

Lin

et al. 2010

Physica Status Solidi (a)

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Carbon films are deposited on silica glass fibers by radiofrequency plasme enhanced chemical vapor deposition (rf-PECVD), and the properties of these fibers are improved by rapid thermal annealing. The annealing temperatures are set to 100, 200, 300, 400, 500, 550, 600, and 700 degrees C. Experimential results show that the thickness and surface roughness of carbon films decrease with increasing annealing temperature, ranging from as deposited to 500 degrees C, while the sp(2) carbon bonding, sp(3) CH(3) bonding optical bandgap and water contact angle (CA) of carbon films increase. As the annealing temperature increases from 500 to 700 degrees C, parts of the carbon films are delaminated. The sp(3) CH(3) bonding in carbon films is shifted to the sp(3) CH(2) bonding, and the sp(3) CH(2) bonding is subsequently transferred to the sp(2) CH bonding. Meanwhile, the amount of the sp(2) carbon bonding in carbon films increases, while the optical bandgap decreases. Based on the evaluation of water repellency and low- temperature morphology of carbon films, the carbon film annealed at a temperature of 500 degrees C is the best for production of carbon-coated optical fibers. As compared to conventional thermal annealing (CTA), rapid thermal annealing (RTA) is more effective to improve the properties of carbon-coated optical fibers. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinhei

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

The effect of rapid thermal annealing on characteristics of carbon coatings on optical fibers

Chen

Lin

et al. 2010

Physica Status Solidi (a)

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“…Rapid thermal processes (RTPs) are applied to silicon wafers for oxidation, annealing, thin-film growing and other purposes [1][2][3][4][5]. RTP systems employ various heat-radiation sources [6] such as tungsten-halogen lamps.…”

Section: Introductionmentioning

confidence: 99%

Silicon heating by a microwave-drill applicator with optical thermometry

Herskowits¹,

Livshits²,

Stepanov³

et al. 2007

Semicond. Sci. Technol.

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This paper presents a method for heating silicon wafers locally by open-end coaxial microwave applicators, with optical techniques employed for measuring the temperature. Silicon samples of ∼2 × 2 cm 2 area were radiated in air atmosphere by a microwave drill operating at 2.45 GHz in the range of 20-450 W. The rate of temperature variation was measured by the Fabry-Pérot etalon effect in samples illuminated by InGaAs lasers. The steady-state temperatures were measured by the changes in the absorption index of an InGaAs laser beam. The experimental results indicate heating rates of ∼150 K s −1 and a temperature range of 300-900 K across the silicon sample during the microwave heating process. Further operation of the microwave drill caused local melting of the silicon samples. This paper presents the experimental setup and results, as well as numerical simulations of the microwave heating process.

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“…Rapid Thermal Processing (RTP) is emerging as a key replacement for conventional furnace processing. RTP presents advantages in temperature control, ambient purity, cycle time and process flexibility [10]. Many manufacturing steps require thermal processing, and the trend is to reduce the process temperature and duration as much as possible in order to restrict the motion of atoms through atomic diffusion.…”

Section: Introductionmentioning

confidence: 99%

Study of copper diffusion into tantalum nitride (Ta/sub 2/N) by rapid thermal annealing (RTA)

Loh¹,

Zhang²,

Liu³

et al. 2002

Proceedings: 6th IEEE Workshop on Signal Propagation on Interconnects

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We have carried out direct diffusion measurements of Cu into Ta 2 N. Thin films of 50nm thickness of Cu were grown onto a thick Ta 2 N layer of 1µm deposited by Ionized Metal Plasma (IMP). Samples were annealed in a rapid thermal system from temperatures ranging from 400°C to 750°C for periods of 180s. Results based on sheet resistance measurements, x-ray diffraction analyses, atomic force microscopy measurements and secondary ion mass spectroscopy analyses consistently follow a transformation of amorphous Ta 2 N to a crystalline phase and finally forming Cu-Ta-O compounds at higher annealing temperatures. The copper and tantalum nitride diffusion profile was performed using Secondary Ion Mass Spectroscopy. The Cu diffusion coefficients in Ta 2 N can be described by 1.5778 × 10 -12 exp (-0.4066 eV/kT) cm 2 /s. To assure reliability, the extent of both diffusions should be considered in device design and processing.

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Rapid thermal processing technology for the 21st century

Cited by 27 publications

References 19 publications

The effect of rapid thermal annealing on characteristics of carbon coatings on optical fibers

The effect of rapid thermal annealing on characteristics of carbon coatings on optical fibers

Silicon heating by a microwave-drill applicator with optical thermometry

Study of copper diffusion into tantalum nitride (Ta/sub 2/N) by rapid thermal annealing (RTA)

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