Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor

In this study, we examine the potential of Gd dopants to replace Al dopants in ZrO 2 -based dynamic random-access memory (DRAM) capacitors. While using Al dopants is a practical approach to solving the leakage current problem of ZrO 2 , it induces tetragonal crystallinity deterioration of the ZrO 2 dielectric thin film, thereby decreasing the capacitance. The Gd-doped ZrO 2 dielectric thin film demonstrated promising results in suppressing the leakage current while preserving the tetragonal crystallinity. Moreover, the suppression of the leakage current mechanism by Gd doping is discussed and shown to be due to the increasing conduction band offset caused by the acceptor (p-type) doping effect. Consequently, the Gd-doped ZrO 2 achieved a minimum equivalent oxide thickness value of 0.76 nm while satisfying the specifications of the DRAM leakage current density (<10 −7 A/cm 2 at an applied voltage of +0.8 V).

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Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor

Cited by 2 publications

References 57 publications

New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition

New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition

Achieving Equivalent Oxide Thickness Scaling of a ZrO₂ Dielectric Thin Film via Gd Doping without Sacrificing Tetragonal Crystallinity

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Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor

Cited by 2 publications

References 57 publications

New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition

New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition

Achieving Equivalent Oxide Thickness Scaling of a ZrO2 Dielectric Thin Film via Gd Doping without Sacrificing Tetragonal Crystallinity

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Product

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Achieving Equivalent Oxide Thickness Scaling of a ZrO₂ Dielectric Thin Film via Gd Doping without Sacrificing Tetragonal Crystallinity