Reactions of Difluorosilylene with Amines, Phosphines and Halomethanes The First Evidence of the Insertion of Difluorosilylene into Tetrafluorosilane

Abstract

The reactions of SiFjSiF 4 with amines, phosphines and various halomethanes were studied. The resultsshow that in the presence of strong Lewis base (Et 3N, HNEt 2 , PR 3, PR 2Cl), SiF 2 inserts initially into SiF 4 W form Si 2F 6, which was followed by subsequent reactions leading to products containing SiF 3 groups. This is the first report of the insertion of SiF 2 into Sif 4 , When the reactants were a weaker base (such as RPCI2, CX 3Br, X::=:F, CI), insertion of SiF 2 into P-Cl and C-Br bonds became predominant.