1997
DOI: 10.1016/s0927-0248(97)00011-1
|View full text |Cite
|
Sign up to set email alerts
|

Reactive ion etching (RIE) as a method for texturing polycrystalline silicon solar cells

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
39
0

Year Published

1999
1999
2023
2023

Publication Types

Select...
7
1
1

Relationship

0
9

Authors

Journals

citations
Cited by 79 publications
(39 citation statements)
references
References 6 publications
0
39
0
Order By: Relevance
“…In the mechanical texturing processes [60,61], trenches are milled into the substrate. The usual choice in industry is the reactive ion etching (RIE) process [62][63][64][65][66]. As the mechanical texturing process is independent of the crystal direction of the silicon substrate, textured substrates can be made also on polycrystalline silicon.…”
Section: Texturingmentioning
confidence: 99%
“…In the mechanical texturing processes [60,61], trenches are milled into the substrate. The usual choice in industry is the reactive ion etching (RIE) process [62][63][64][65][66]. As the mechanical texturing process is independent of the crystal direction of the silicon substrate, textured substrates can be made also on polycrystalline silicon.…”
Section: Texturingmentioning
confidence: 99%
“…The textured surface morphologies are used to enhance the light absorbing capability of silicon solar cells by improved light scattering and lower reflectance [1][2][3][4][5]. The textured surface structures increased the light absorption and the short circuit current density (J sc ) of solar cells [1,20,21].…”
Section: Introductionmentioning
confidence: 99%
“…Various texturing techniques like wet chemical etching, mechanical grooving, laser sculpturing and plasma etching have been used to texture the crystalline silicon (c-Si) and glass substrates. The wet chemical etching is preferred due to the low cost and less experimental process steps [2]. If the etching reaction is same in any direction then the etching is known as isotropic etching, whereas anisotropic etching is to remove the material in specific directions to get often flat and intricate shapes.…”
Section: Introductionmentioning
confidence: 99%
“…While dry etching using the reactive ion etching (RIE) process [4,5] is the most widely used technology, it is too expensive for solar cells. Wet etching [6], using an aqueous alkaline solution, is cheaper, but its use is limited to c-Si and it is not suitable for multicrystalline silicon (mc-Si) since the mc-Si grains have different orientations, unlike the c-Si grains. Metal-assisted chemical etching (MACE) and perpendicular direction etching can be applied to c-Si and mc-Si to obtain nanoporous structures to show the light trapping effect and increase the optical path through multiple reflections [7][8][9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%