“…While dry etching using the reactive ion etching (RIE) process [4,5] is the most widely used technology, it is too expensive for solar cells. Wet etching [6], using an aqueous alkaline solution, is cheaper, but its use is limited to c-Si and it is not suitable for multicrystalline silicon (mc-Si) since the mc-Si grains have different orientations, unlike the c-Si grains. Metal-assisted chemical etching (MACE) and perpendicular direction etching can be applied to c-Si and mc-Si to obtain nanoporous structures to show the light trapping effect and increase the optical path through multiple reflections [7][8][9][10][11][12].…”