2021
DOI: 10.1016/j.apsusc.2021.150138
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Reactive pulsed DC magnetron sputtering deposition of vanadium oxide thin films: Role of pulse frequency on the film growth and properties

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Cited by 10 publications
(13 citation statements)
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“…7c. This results in the decreasing of deposition rate as rising of pulsed frequency which is consistent to the conclusion in literature 10,11 .…”
Section: Pulsed Frequencysupporting
confidence: 92%
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“…7c. This results in the decreasing of deposition rate as rising of pulsed frequency which is consistent to the conclusion in literature 10,11 .…”
Section: Pulsed Frequencysupporting
confidence: 92%
“…Furthermore, more argon ion flux is seen in DCM case. As a result of that, the deposition rate using DCM will be bigger than that using P-DCM which is also found in the experimental work of Glocker 4 and Dong 11 . Besides, the argon ion…”
Section: Pulsed Frequencysupporting
confidence: 67%
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“…The methods include techniques such as micro-arc oxidation (MAO), magnetron sputtering deposition, electrophoretic deposition, anodic oxidation, electrolytic polishing, galvanizing process, screen printing, powder coating, water transfer printing, electrophoresis, etc. [15][16][17][18][19][20][21][22][23][24]. Among these methods, MAO is of great interest because of the advantages of a simple process, no pollution, no need for vacuum or low-temperature conditions, etc.…”
Section: Introductionmentioning
confidence: 99%