Reactive R.F. magnetron sputtering deposition of WO3 thin films

Optical properties and surface morphology of evaporated (WO3)1−x–(Fe2O3)x thin films

“…roughness is measured¨14.3 nm for the annealed WO 3 film. The sharp increase in the roughness for the annealed film as compared to the ''as deposited'' film can be due to their crystallization process, as reported by others [10,11,18,25].…”

“…It has been reported that the suitable condition to obtain WO 3 thin film with stoichiometric composition and good crystallinity is annealing ''as deposited'' WO 3 films at T = 400 -C [11,25]. Thus, in this study, after the deposition process, all the deposited films were annealed at 400 -C in air for a period of 60 min.…”

“…Tungsten oxide (WO 3 ) thin film has been extensively studied during past years due to its potential technological applications in selective catalysts [1,2], electrochromic devices [3 -9], gas sensors [10,11], gaschromic [12] and nanowires [13]. WO 3 thin films can be prepared by various deposition techniques such as thermal evaporation [14], magnetron sputtering [11], solution spray [7], pulsed laser ablation [15], chemical vapor deposition [16] and sol -gel coating [17].…”

“…WO 3 thin films can be prepared by various deposition techniques such as thermal evaporation [14], magnetron sputtering [11], solution spray [7], pulsed laser ablation [15], chemical vapor deposition [16] and sol -gel coating [17].…”

Thermal modelling of a WO3 ozone sensor response

“…In a previous work, influence of the preparation conditions upon the composition, the structure and the morphology of WO 3 thin films were studied [10]. The choice of a SiO 2 /Si substrate for the fabrication of the gas microsensors had been undertaken.…”