Reactively sputtered indium oxide diffusion barrier

Kolawa, E.; Nieh, C. W.; Molarius, Jyrki; Tran, L.T.; Garland, C. M.; Flick, W.; Nicolet, M.‐A.; So, F. C. T.; Wei, Jun

doi:10.1016/0040-6090(88)90361-6

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Cited by 9 publications

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“…Several deposition techniques have been employed to grow polycrystalline indium oxide films, such as dc and rf sputtering [7][8][9][10][11][12][13][14][15][16][17][18][19][20][21][22], reactive evaporation [23][24][25][26][27][28][29][30][31][32][33][34][35], evaporation of metallic indium and subsequent oxidation [36][37][38], chemical vapour deposition [39][40][41][42][43], spray pyrolysis [44][45][46][47], ion plating [48][49][50][51][52] and laser ablation [53]. In each of these methods, deposition occurs in a background atmosphere of oxygen.…”

Section: Introductionmentioning

confidence: 99%