Real-time amine monitoring and its correlation to critical dimension control of chemically amplified resists for sub-0.25-μm geometries

Conley, Will; Babcock, Carl P.; Lilygren, John A.; Sandstrom, Clifford P.; Farrar, Nigel R.; Piatt, J.A.; Kinkead, Devon A.; Goodwin, William; Kishkovich, Oleg P.; Higley, John K.; Cate, P.

doi:10.1117/12.312479

Cited by 4 publications

(3 citation statements)

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“…The process of exposing the IDE and The effects of ambient base upon chemically amplified photoresists are well documented. 13,14 Small amounts of base, on the order of a few ppb in the ambient air, can neutralize acid generated in a chemically amplified photoresist and lead to image degradation problems such as T-topping. Such neutralizations due to ambient base could severely degrade the performance of a technique designed to measure the small amounts of acid generated in chemically amplified resists.…”

Section: Acid Generation Measurementsmentioning

confidence: 99%

Measurement of photoacid generation kinetics in photoresist thin films via capacitance techniques

Berger

Henderson

2003

Advances in Resist Technology and Processing XX

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A novel technique for determining the Dill C rate constant for photoacid generation has been investigated. This technique involves using capacitance measurements of interdigitated electrodes (IDE) coated with chemically amplified resist to monitor the generation of photoacid within the resist polymer matrix. It is shown that a linear relationship exists between measured capacitance of the IDE and photoacid or PAG concentration within the polymer matrix. Based on this linear relationship, a method is developed for calculating the Dill C parameter for chemically amplified resists based on interdigitated electrode capacitance data. This approach is demonstrated by measuring the Dill C parameter for acid generation using 248 nm exposure of triphenylsulfonium triflate photoacid generator in a poly(p-hydroxystyrene) matrix. A Dill C parameter value of 0.0445 was calculated using this capacitance method which is in good agreement with other literature reported values for this PAG.

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Section: Acid Generation Measurementsmentioning

confidence: 99%

Measurement of photoacid generation kinetics in photoresist thin films via capacitance techniques

Berger

Henderson

2003

Advances in Resist Technology and Processing XX

View full text Add to dashboard Cite

show abstract

“…4,5 Small amounts of base, on the order of a few ppb in the ambient air, can neutralize photoacid generated in a chemically amplified photoresist and lead to image degradation problems such as T-topping. Such neutralizations due to ambient base can also severely degrade the performance of a technique designed to measure the small amounts of acid generated in chemically amplified resists.…”

Section: Acid Generation Measurementsmentioning

confidence: 99%

“…where C MIN is measured). These expressions can now be inserted into equation 2 to create the following expression: ( 4 ) It is assumed that at the final large exposure dose (i.e. the dose when the capacitance versus dose is no longer changing), all of the initial PAG molecules have been converted to their photoproducts on a 1:1 molar basis.…”

Section: Pagmentioning

confidence: 99%

Chemically amplified photoresist characterization using interdigitated electrodes: an improved method for determining the Dill C parameter

Berger

Henderson

2004

SPIE Proceedings

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We have recently developed a technique that utilizes capacitance data from resist coated interdigitated electrodes to measure the kinetic rate constant of photoacid generation (commonly referred to as the Dill C parameter) for photoacid generators in chemically amplified resists. The work presented in this paper focuses on a recently improved version of the IDE Dill C measurement technique. The original version of the technique required coating several IDEs with resist films containing different loadings of photoacid generator and then using the capacitance data from these IDEs to calculate linear mixing relationships between IDE capacitance and the content of PAG or photoproducts within the resist film. The improved version of the technique reported here totally eliminates the need for this "calibration process" through the use of normalized capacitance data. Elimination of the need to measure linear mixing relationships independently for each PAG and polymer combination gives the improved technique many advantages over the prior version. These include improved curve fitting and accuracy of Dill C calculations; fewer raw materials, IDEs, and experimental time; and most importantly, the potential to measure the Dill C for a resist from a single IDE with no prior knowledge of the resist's photoacid generator type or loading. A detailed derivation of the normalization scheme is presented in this paper, along with evidence of the dramatic improvement in model curve fit that can be achieved using this technique. In addition, Dill C parameters measured for five different photoacid generators with both the original and normalized version of the IDE technique are presented to demonstrate that both techniques measure the same Dill C parameter and hence are describing the same physical phenomena.

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Porous organic–inorganic hybrids for removal of amines via donor–acceptor interaction

Chung

Chou

Kim³

2006

Materials Chemistry and Physics

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Real-time amine monitoring and its correlation to critical dimension control of chemically amplified resists for sub-0.25-μm geometries

Cited by 4 publications

References 0 publications

Measurement of photoacid generation kinetics in photoresist thin films via capacitance techniques

Measurement of photoacid generation kinetics in photoresist thin films via capacitance techniques

Chemically amplified photoresist characterization using interdigitated electrodes: an improved method for determining the Dill C parameter

Porous organic–inorganic hybrids for removal of amines via donor–acceptor interaction

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