Real-time optical modelling and investigation of inorganic nano-layer growth onto flexible polymeric substrates

In-line monitoring and quality control of flexible organic electronic materials

“…Several published studies (Georgiou, Laskarakis, Koidis, Goktsis, & Logothetidis, 2008;Gravalidis, Gioti, Laskarakis, & Logothetidis, 2004;Laskarakis, Kassavetis, et al, 2010;Laskarakis, Georgiou, & Logothetidis, 2010) have reported the adaptation of SE units onto vacuum chambers for the in situ and real-time investigation of the optical properties of different inorganic and organic nanomaterials during their deposition by magnetron sputtering or evaporation methods. This methodology can provide information on the growth mechanisms and the deposition rate of the studied nanomaterials and the effect of the experimental parameters on the nanomaterials structure.…”

Interpretation of Absolute Laser Reflectance During Optical Monitoring of Polycrystalline GaAs Deposition on Quartz Using Metalorganic Chemical Vapor Deposition

“…Spectroscopic ellipsometry [1][2][3][4][5][6][7][8] (SE) or optical reflectometry (OR) [9][10][11][12][13][14][15] can be used as an in situ analytical tool for thin film processes such as chemical bath deposition (CBD) 1 , thermal 2 or electron beam evaporation 3 , atomic layer deposition (ALD) 4 , sputtering 5 , molecular beam epitaxy 6 (MBE) and metal organic chemical vapor deposition (MOCVD) [7][8][9][10][11][12][13][14][15] .…”

“…SE is a particularly powerful method which can be used to simultaneously obtain the optical constants for refractive index (n) and extinction coefficient (k) at different wavelengths by using known models such as Cauchy 1,5 and/or Lorentz 1,3 . These optical parameters can be used to obtain film thickness, including the absorption coefficient (α) as a function of wavelength (λ) using the relation (α = 4kπ/λ).…”