We report the realization
of an acoustic capacitive microphone
formed by graphene/poly(methyl methacrylate) (PMMA). It is the first
time that the ultra-large graphene/PMMA membrane suspended fully over
the cavity has been fabricated by releasing the silicon dioxide sacrificial
layer underneath the membrane. The novelty in the fabrication method
is that the silicon dioxide layer has been etched by hydrogen fluoride
vapor from the back of the partly etched silicon substrate. Using
the new process, the ultra-large graphene/PMMA membrane, with a diameter
to thickness ratio of 7800, has been suspended over the cavity with
a 2 μm air gap. The spacing of 2 μm is the minimum gap
over the graphene-based acoustic capacitive microphones which have
been reported so far. The static deformation of the suspended graphene/PMMA
membrane after silicon dioxide has been etched is estimated to be
270 nm. The aspect ratio of the membrane’s diameter over its
static deformation is around 13,000, which shows that the graphene/PMMA
membrane with a diameter of a few millimeters can be transferred and
suspended over the substrate with relatively small deformation by
releasing the sacrificial silicon dioxide layer. The dynamic behavior
of the device under electrostatic actuation has been characterized.
The acoustic response of the graphene/PMMA capacitive microphone has
been measured, and the sensitivity has been observed to be −47.5
dB V (4.22 mV/Pa) ± 10%. The strain in the graphene/PMMA membrane
is estimated to be 0.034%.