Realization of Deep UV Plasmonic Enhancement to Photo Response through Al Mesh

Abstract

High-performance UV detectors are of great significance for various applications. Plasmonic structures enable great improvement of the performance of detectors. However, to push the plasmonic enhancement to photo response into the deep-UV region presents some challenges. In this work, we found that the optical properties of the supporting layer play important roles in achieving the optimal plasmonic enhancement. Therefore, we fully considered the dependence of the optical constants of the MgZnO supporting layer, which is a promising material to realize deep-UV photodetectors, on microstructure and crystalline quality, which are related to the fabrication method. Based on the optical constants, we designed an Al mesh plasmonic structure and fabricated it with a polystyrene monolayer as a mask. Finally, we demonstrated a three-times enhancement to photo response with UV radiation at 254 nm.

Tuning the Plasmonic Resonance Peak for Al Nanorods on AlGaN Layer to Deep Ultraviolet Band

“…D eep ultraviolet (DUV) photodetectors have received significant research attention for a wide range of applications such as missile alert, ultraviolet (UV) communication, ozone monitoring, fire alarm, biological detection, air and water purification, sterilization, DUV curing, etc. [1]. Among the candidates for making DUV photodetectors, the AlGaN material system is a very promising option due to the large bandgap, chemical stability and high melting point [2], [3].…”