Kinetic pathways for Si adatoms incorporation into Ge͑105͒ are explored by density-functional theory. A very low activation energy ͑between ϳ0.6 and ϳ0.84 eV, depending on strain͒ for Si/Ge exchanges is found. Consequences on the Ge distribution within SiGe islands on Si͑001͒ are discussed, illustrating why the above processes can influence strain relaxation. Fast exchange processes are shown to take place also in the presence of Si ad-dimers, further facilitating the creation of a Ge floating layer under Si deposition, lowering the surface energy of the exposed facet.