2021
DOI: 10.1039/d0nr07539f
|View full text |Cite
|
Sign up to set email alerts
|

Recent advances in focused ion beam nanofabrication for nanostructures and devices: fundamentals and applications

Abstract: The past few decades have witnessed growing research interest in developing powerful nanofabrication technologies for three-dimensional (3D) structures and devices to achieve nano-scale and nano-precision manufacturing.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
5

Citation Types

0
109
0
1

Year Published

2021
2021
2024
2024

Publication Types

Select...
9

Relationship

0
9

Authors

Journals

citations
Cited by 189 publications
(110 citation statements)
references
References 284 publications
0
109
0
1
Order By: Relevance
“…Conventional photolithography is unable to get the required nanoscale features. Some of the suitable techniques to overcome its limitations would be electron-beam lithography [ 27 ], dip-pen lithography [ 28 ], and focused-ion lithography [ 29 ]. However, these are not always available, as well as being expensive and time-consuming.…”
Section: Introductionmentioning
confidence: 99%
“…Conventional photolithography is unable to get the required nanoscale features. Some of the suitable techniques to overcome its limitations would be electron-beam lithography [ 27 ], dip-pen lithography [ 28 ], and focused-ion lithography [ 29 ]. However, these are not always available, as well as being expensive and time-consuming.…”
Section: Introductionmentioning
confidence: 99%
“…Different from the random and irregular etching conducted by common defect engineering methods, accurately controlled etching can be implemented via FIB. [ 35,36 ] The highly focused and directional Ga + ion beam makes it possible to expose designed quantitative edge lengths. Meanwhile, other areas in the basal plane would not be affected, thus maintaining its pristine properties.…”
Section: Introductionmentioning
confidence: 99%
“…Ion beam induced deposition (IBID) can prepare delicate and high aspect ratio three-dimensional nanostructures with excellent mechanical strengths [ 15 ]. Advances in FIB deposition has allowed the production of nanostructures and devices with a broad range of applications including micro/nano electromechanical systems [ 16 ]. However, the purity of the deposited material is not absolute as carbons species are always retained in the deposited film.…”
Section: Introductionmentioning
confidence: 99%
“…However, the purity of the deposited material is not absolute as carbons species are always retained in the deposited film. For FIB structures, such as nanoconductors, there is a requirement to monitor and remove contamination, improving the conductivity of the deposited metal [ 16 ]. Similarly, organic contaminants deposited during FIB fabrication have also been shown to lower the Young’s modulus of three-dimensional microstructures [ 17 ].…”
Section: Introductionmentioning
confidence: 99%