New Research on Silicon - Structure, Properties, Technology 2017
DOI: 10.5772/67720
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Recent Advances in Silicon Photodetectors Based on the Internal Photoemission Effect

Abstract: Silicon technologies provide an excellent platform in order to realize microsystems where photonic and microelectronic functionalities are monolithically integrated on the same substrate. In recent years, a lot of passive and active silicon photonic devices have been optimized to work at telecom wavelengths where, unfortunately, silicon has a neglectable optical absorption due to its bandgap of 1.12 eV. Although silicon cannot detect wavelengths above 1.1 μm, in recent years, tremendous advances have been made… Show more

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Cited by 3 publications
(2 citation statements)
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References 76 publications
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“…Several new structures have been reported in literature combining, for example, IPA with nanoscale metallic structures, comprising Si nanoparticles (NPs) [ 39 ], metal stripes allowing surface plasmon polaritons (SPPs) [ 40 , 41 ], metallic gratings [ 42 ] and new structures based on two-dimensional materials (like graphene) capable to substitute metal in the Schottky junction [ 43 ]. Moreover, as reported in some complete review on this topic [ 44 , 45 ], due to the unipolar nature of the Schottky junction, IPE based PDs are very fast and can be monolithically integrated with Si-based CCD for IR applications [ 46 ].…”
Section: Group IV Semiconductorsmentioning
confidence: 99%
“…Several new structures have been reported in literature combining, for example, IPA with nanoscale metallic structures, comprising Si nanoparticles (NPs) [ 39 ], metal stripes allowing surface plasmon polaritons (SPPs) [ 40 , 41 ], metallic gratings [ 42 ] and new structures based on two-dimensional materials (like graphene) capable to substitute metal in the Schottky junction [ 43 ]. Moreover, as reported in some complete review on this topic [ 44 , 45 ], due to the unipolar nature of the Schottky junction, IPE based PDs are very fast and can be monolithically integrated with Si-based CCD for IR applications [ 46 ].…”
Section: Group IV Semiconductorsmentioning
confidence: 99%
“…Custom process silicon IPE based detectors have been demonstrated in literature, of which an overview is given in [28]. The results vary widely, with responsivities ranging from 10 μA/W to 1.25 A/W.…”
Section: Photodiode Modelmentioning
confidence: 99%