2016
DOI: 10.1002/advs.201500405
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Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage

Abstract: Electrode materials play a decisive role in almost all electrochemical energy storage devices, determining their overall performance. Proper selection, design and fabrication of electrode materials have thus been regarded as one of the most critical steps in achieving high electrochemical energy storage performance. As an advanced nanotechnology for thin films and surfaces with conformal interfacial features and well controllable deposition thickness, atomic layer deposition (ALD) has been successfully develop… Show more

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Cited by 98 publications
(61 citation statements)
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References 197 publications
(243 reference statements)
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“…[131] Furthermore, the facilitation of 3D microbatteries relies on emerging thin-film deposition techniques. [128,132] Among these advanced microfabrication strategies, the ALD technique can produce highly protected, uniform, and reproducible atomic-scale films on high-aspect-ratio substrates by precisely control over the thickness, homogeneity, and structure, as shown in Table 3. Based on the aforementioned properties, these ALD-designed films demonstrate great potential as a 3D electrode and solid-state electrolyte for microbatteries.…”
Section: D Electrodes By Ald For Microbatteriesmentioning
confidence: 99%
“…[131] Furthermore, the facilitation of 3D microbatteries relies on emerging thin-film deposition techniques. [128,132] Among these advanced microfabrication strategies, the ALD technique can produce highly protected, uniform, and reproducible atomic-scale films on high-aspect-ratio substrates by precisely control over the thickness, homogeneity, and structure, as shown in Table 3. Based on the aforementioned properties, these ALD-designed films demonstrate great potential as a 3D electrode and solid-state electrolyte for microbatteries.…”
Section: D Electrodes By Ald For Microbatteriesmentioning
confidence: 99%
“…In particular, ALD is an attractive vapor‐based self‐terminating thin film growth technique, which can deliver a conformal coverage of layered materials with well‐controlled thickness . In recent years, ALD has been a viable method used to fabricate 1D nanomaterials due to its precise thickness control and large‐scale uniformity.…”
Section: Advantages and Synthetic Routes Of 1d Nanostructured Materialsmentioning
confidence: 99%
“…The atomic layer deposition (ALD) technique has been used to obtain uniform surface coatings with controlled thickness on top of the Li-and Mn-rich cathode materials [63]. Choi [64].…”
Section: Modifications Of XLImentioning
confidence: 99%