1997
DOI: 10.1088/0022-3727/30/14/018
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Reconstruction of sputtered copper atom densities in a hollow-cathode glow discharge lamp

Abstract: Atomic absorption spectrometry (AAS) is used to probe the distribution of sputtered copper atoms in the body of a discharge cell specially constructed to reproduce the environment of a hollow-cathode lamp. The use of a reconstruction in the treatment of data obtained from absorption measurements is detailed and demonstrated. Sample data from sputtering cells filled with argon and neon are evaluated. The resulting backprojection data set enables a numerical density of atoms at the top of the cathode bore to be … Show more

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Cited by 3 publications
(7 citation statements)
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“…In equation (10), the value of is a line shape parameter that represents the departure of the emission and absorption profiles from that expected for the idealized case of an unsplit, purely Doppler-broadened absorption line [28][29][30][31]. A value of = 0.321 has been derived empirically [31] for the copper 2 P 3/2 -2 S 1/2 transition considered in the present work.…”
Section: Comparing the Calculated Profile With Experimental Datamentioning
confidence: 98%
See 3 more Smart Citations
“…In equation (10), the value of is a line shape parameter that represents the departure of the emission and absorption profiles from that expected for the idealized case of an unsplit, purely Doppler-broadened absorption line [28][29][30][31]. A value of = 0.321 has been derived empirically [31] for the copper 2 P 3/2 -2 S 1/2 transition considered in the present work.…”
Section: Comparing the Calculated Profile With Experimental Datamentioning
confidence: 98%
“…These absorption measurements were recorded in the region above a hollow cathode mounted in a sputtering cell based on a standard Pyrex hollow-cathode lamp structure as shown in figure 1. This cell was mounted on an optical rail using a standard carrier with calibrated, adjustable, transverse and vertical slides to allow absorption measurements to be made in a raster sequence above the cathode, as described in [10].…”
Section: The Instrumental or 'Smoothing' Functionmentioning
confidence: 99%
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“…A typical rate of the sputtered material line intensity to that of the buffer gas is generally a few orders higher than that of the respective concentrations of atoms which are volunteers for excitation, which is very important, for example see van Veldhuizen [10], Oliver and Finlayson [11] and Kusano et al [12]. This surprising fact occurs in all papers concerning the cathode zone plasma and has not yet been fully explained.…”
Section: Introductionmentioning
confidence: 99%