Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer

Abstract

Templated self-assembly of block copolymer (BCP) thin films can enhance the resolution and throughput of nanoscale lithography processes. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18] This method has been used to produce large-area defect-free lamellar, cylindrical, or spherical microdomain patterns through chemical [1][2][3][4][5][6] or topographical [7][8][9][10][11][12][13][14][15] templating. However, the formation of complex patterns with multiple morphologies in one BCP film (e.g. coexisting cylinders and spheres) requires additional process steps such as sequential cross-linking and solvent anneals. [19,20] The period of the patterns is determined by the BCP chain length, and sub-10-nm-period (sub-5-nm halfpitch) patterns have been reported from low molecular weight BCPs. [8] While a hexagonal lattice of microdomains is readily obtained from a diblock copolymer, obtaining a square symmetry pattern requires 1:1 templating of a diblock copolymer [21] , or use of a triblock terpolymer [22] or a blend of diblock copolymers [23] . We show that by using an array of majority-block-functionalized posts, it is possible to locally control the morphology of a

Nanostructured polymer blends based on polystyrene‐b‐polybutadiene‐b‐poly(methyl methacrylate) triblock copolymers modified with polystyrene and/or poly(methyl methacrylate) homopolymers

“…The final result consists in the breakup of lamellae generating a perforated net which will lead to the formation of cylinders. For this mixture, the core of cylinders will consist of PMMA block domains stacked up, embedded in the block that constitutes the shell . Figure shows a scheme of the transition in which the evolution from a lamellar morphology to a cylindrical one is illustrated, together with a 3D AFM height image of Fig.…”

Design rules for self-assembled block copolymer patterns using tiled templates

“…Furthermore, as shown in Fig. 4g,h, self-consistent field theory (SCFT) simulations [29][30][31][32][33] were used to calculate the block copolymer morphology resulting from the input templates of Fig. 4a,b.…”

Rapid shear alignment of sub-10 nm cylinder-forming block copolymer films based on thermal expansion mismatch

“…Silicon wafers (3′′ diameter, p-type, 〈100〉, from Silicon Valley Microelectronics, Inc.) were used as-is from the manufacturer, or coated with PDMS or PS brush [53]. A solution of poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) (from Polymer Source, Inc., Montreal, Canada, 16 kg mol…”