Surface and Coatings Technology
 2020
DOI: 10.1016/j.surfcoat.2020.126018
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Redeposition-free of silicon etching by CF4 microwave plasma in a medium vacuum process regime

Chupong Pakpum
1
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Dheerawan Boonyawan
2
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Cited by 6 publications
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References 44 publications
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Study on the thermal effect in ultra-fast plasma-enhanced fluorination for high-quality CFx cathode materials

Yao
1
,
Zhou
2
,
Chen
3
et al. 2023
Diamond and Related Materials
5
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Study on the thermal effect in ultra-fast plasma-enhanced fluorination for high-quality CFx cathode materials

Yao
1
,
Zhou
2
,
Chen
3
et al. 2023
Diamond and Related Materials
5
0
0
0
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Study on silicon removal property and surface smoothing phenomenon by moderate-pressure microwave hydrogen plasma

Ohmi
1
,
Kimoto
2
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Nomura
3
et al. 2021
Materials Science in Semiconductor Processing
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Produce various powder coated surfaces with stable metal shine via microwave energy

Liu
1
,
Zhang
2
,
Shao
3
et al. 2021
Progress in Organic Coatings
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