“…This shadows the semiconducting properties of Si and becomes more critical for nanoscale devices whose output will be dominated by the SiO x layer . Conventionally, self-assembled monolayers comprising alkyl chains are used to protect Si from oxidation by blocking oxygen and water from reaching the bulk silicon. ,− This however comes with an expense of the need for complicated fabrication procedures that often require external effects, such as heat, light, or radical initiators, to enable the formation of covalent bonds between the monolayer-forming molecules and the surface. − In addition, the length of the alkyl chain on the molecules in the monolayer should be long enough to enable efficient packing . However, longer-chain molecules also come with the expense of blocking electron transfer. − Packing defects in monolayers, which allows for oxygen and water to reach the Si surface, lead to monolayer degradation over time. ,, Hence, there is a need to find a procedure to protect Si from oxidation while preserving the electron-transferring capability of the protecting layer.…”