Reduction of absorption loss in multicrystalline silicon via combination of mechanical grooving and porous silicon

Rabha, M. Ben; Mohamed, S. Belhadj; Dimassi, Wissem; Gaidi, Mounir; Ezzaouia, Hatem; Bessaı̈s, B.

doi:10.1002/pssc.201000153

Cited by 19 publications

(8 citation statements)

References 10 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…They also used mechanical grooving method for surface treatment of multicrystalline silicon wafers, and the total reflectivity dropped to about 5% in the 400–1000 nm wavelength range. 52 Yoo et al 53 reported large-area multicrystalline silicon solar cell fabrication using RIE and observed an average surface reflectance of 13.3% for 15 min RIE-textured samples, with the conversion efficiency of solar cell reaching 16.1%. Kong et al 47 developed nanosized pyramid column structures on a silicon surface for crystalline silicon solar cells by RIE and obtained an average surface reflectance of 1.16% in the wavelength range of 400–1000 nm without any anti-reflection coating.…”

Section: Worldwide Research Status Outside Chinamentioning

confidence: 99%

Research status and application prospects of manufacturing technology for micro–nano surface structures with low reflectivity

Zheng

Wang

Jiang

et al. 2014

Proceedings of the Institution of Mechanical Engineers, Part B:

View full text Add to dashboard Cite

The light trapping surface of micro-nanostructure can significantly improve the performance of optical transmission and can greatly reduce the broadband domain of material surface reflectivity, which means the material surface absorptivity on wide-spectrum signal is enhanced. Several commonly used methods for manufacturing micro-nano surface of light trapping structure with low reflectivity are introduced first, including chemical etching, mechanical grooving, reactive ion etching, common long-pulse laser grooving, and ultra-fast pulse laser processing. This is followed by a comparison of the advantages and disadvantages of these methods. Among these methods, ultra-fast pulse laser processing is an ideal manufacturing technology for fabrication of light trapping structures. The research status of the micro-nano manufacturing technology of structured surfaces for light trapping with low reflectivity is reviewed, and emphasis is given to their application prospects. The research directions and trends of the micro-nano manufacturing technology of structured surfaces for light trapping with low reflectivity are summarized, and broad application prospects and research value in many fields, such as solar cells, solar water heater, building wave-absorbing materials, information acquisition of mechanized equipments, high-radiation heat exchange equipment, solar heating equipment, and solar air conditioner, are pointed out.

show abstract

Section: Worldwide Research Status Outside Chinamentioning

confidence: 99%

Research status and application prospects of manufacturing technology for micro–nano surface structures with low reflectivity

Zheng

Wang

Jiang

et al. 2014

Proceedings of the Institution of Mechanical Engineers, Part B:

View full text Add to dashboard Cite

show abstract

“…Notably, porous domains or interstitial spaces generated on the semiconductor surface via electrochemical procedures have been shown to serve as effective buffer layers, considerably reducing defect densities and lattice mismatch-induced stresses [44][45][46]. Additionally, it has been demonstrated repeatedly that the nanostructuring of silicon leads to a change in the properties of the monocrystalline counterpart, allowing for a significant improvement in the characteristics of solar cells fabricated based on it [47][48][49].…”

Section: Introductionmentioning

confidence: 99%

Improvement of β-SiC Synthesis Technology on Silicon Substrate

Suchikova,

Kovachov,

Bohdanov

et al. 2023

Technologies

View full text Add to dashboard Cite

This article presents an enhanced method for synthesizing β-SiC on a silicon substrate, utilizing porous silicon as a buffer layer, followed by thermal carbide formation. This approach ensured strong adhesion of the SiC film to the substrate, facilitating the creation of a hybrid hetero-structure of SiC/por-Si/mono-Si. The surface morphology of the SiC film revealed islands measuring 2–6 μm in diameter, with detected micropores that were 70–80 nm in size. An XRD analysis confirmed the presence of spectra from crystalline silicon and crystalline silicon carbide in cubic symmetry. The observed shift in spectra to the low-frequency zone indicated the formation of nanostructures, correlating with our SEM analysis results. These research outcomes present prospects for the further utilization and optimization of β-SiC synthesis technology for electronic device development.

show abstract

“…In laser ablation, high-energy lasers are used to selectively remove silicon material and create grooves on the surface [5], and this offers precise control with minimal damage to surrounding areas. Diamond saw cutting [6,7], meanwhile, uses diamond saws to mechanically cut grooves into a silicon surface, and while it is simpler than other methods, it may not offer the same level of precision. Silicon nanowires (SiNWs) have significant potential for use in the surface grooving of solar cells and other silicon-based electronic devices due to their ability to enhance light absorption, reduce reflectance, improve charge carrier collection, and provide surface passivation, making them a promising means for optimizing device performance [8][9][10][11].…”

Section: Introductionmentioning

confidence: 99%

The Fabrication and Characterization of Silicon Surface Grooving Using the CV Etching Technique for Front Deep Metallic Contact Solar Cells

Rabha,

Choubani,

Bouktif

et al. 2023

Sustainability

View full text Add to dashboard Cite

This study experimentally investigated the use of the chemical vapor etching method for silicon surface grooving for regular front deep metallic contact solar cell applications. The thickness of silicon wafers is a crucial parameter in the production of solar cells with front and back buried contacts, because silicon surface grooves result in a larger contact area, which in turn improves carrier collection and increases the collection probability for minority carriers. A simple, low-cost HNO3/HF chemical vapor etching technique was used to create grooves on silicon wafers with the help of a highly effective anti-acid mask. The thick porous layer of powder that was produced was easily dissolved in water, leaving patterned grooved areas on the silicon substrate. A linear dependence was observed between the etched thickness and time, suggesting that the etching process followed a constant etch rate, something that is crucial for ensuring precise and reproducible etching results for the semiconductor and microfabrication industries. Moreover, by creating shorter pathways for charge carriers to travel to their respective contacts, front deep contacts minimize the overall distance they need to traverse and therefore reduce the chance of carrier recombination within the silicon material. As a result, the internal quantum efficiency of solar cells with front deep metallic contacts improved by 35% compared to mc-Si solar cells having planar contacts. The use of front deep contacts therefore represents a forward-looking strategy for improving the performance of silicon solar cells. Indeed, this innovative electrode configuration improves charge carrier collection, mitigates recombination losses, and ultimately leads to more efficient and effective solar energy conversion, which contributes to sustainable energy development in the areas of clean energy resources. Further work needs to be undertaken to develop energy sustainably and consider other clean energy resources.

show abstract

Reduction of absorption loss in multicrystalline silicon via combination of mechanical grooving and porous silicon

Cited by 19 publications

References 10 publications

Research status and application prospects of manufacturing technology for micro–nano surface structures with low reflectivity

Research status and application prospects of manufacturing technology for micro–nano surface structures with low reflectivity

Improvement of β-SiC Synthesis Technology on Silicon Substrate

The Fabrication and Characterization of Silicon Surface Grooving Using the CV Etching Technique for Front Deep Metallic Contact Solar Cells

Contact Info

Product

Resources

About