Reflectance and Resolution of Multilayer Monochromators for Photon Energies from 400 – 6000 eV

Braun, Stefan; Gawlitza, Peter; Menzel, Maik; Leson, Andreas; Mertin, M.; Schäfers, F.

doi:10.1063/1.2436106

Cited by 11 publications

(5 citation statements)

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“…A W/B 4 C multilayer (ML) with a small double layer period (d-spacing) of 10 Å, 600 layer pairs and a ratio of metal to double layer thickness (Γ) of 0.5 is selected for this XRPD beamline. The fabrication and characterization of this mirror was reported by S. Braun et al [12]. Figure 2(a) shows a comparison of the simulated photon flux from the Ge(220) DCM and from the W/B 4 C DMM.…”

Section: Double Multilayer Monochromatormentioning

confidence: 99%

Synchrotron beamline optics for X-ray powder diffraction under high-pressure conditions at the Siam Photon Laboratory

Saengsuwan¹,

Klysubun²,

Bovornratanaraks³

et al. 2009

Z. Kristallogr. Suppl.

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To support various applications for high-pressure research in Thailand, an experimental setup for X-ray powder diffraction under high-pressure conditions using synchrotron radiation, which is based on station 9.1 at the Daresbury Synchrotron Radiation Source, is being developed on the bending magnet beamline BL8 at the Siam Photon Laboratory. Monochromatic X-rays with a photon energy of 9 keV are provided by a fixed-exit double crystal monochromator equipped with Ge(220) crystals. In a recent experiment, we could record a complete diffraction pattern of the hexagonal phase of ZnO using an image plate area detector. However, diffraction intensity should be improved by adding focusing optics. In this work, we propose the use of a double multilayer monochromator in combination with a focusing mirror. Results from ray-tracing simulation for the proposed optics will be presented.

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Section: Double Multilayer Monochromatormentioning

confidence: 99%

Synchrotron beamline optics for X-ray powder diffraction under high-pressure conditions at the Siam Photon Laboratory

Saengsuwan¹,

Klysubun²,

Bovornratanaraks³

et al. 2009

Z. Kristallogr. Suppl.

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“…Recently development of polarizing elements for use in the higher region has been progressed [5,6]. A W/B 4 C multilayer has been reported to work as the practicable polarizer for 710 eV, although the reflectance for s-polarization at 850 eV remarkably decreases to 0.4% from 5.2% [7]. In the higher energy range than about 0.7 keV, it becomes difficult to develop practicable phase shifters, even polarizers, and consequently to perform polarization measurements.…”

Section: Introductionmentioning

confidence: 99%

Design of an apparatus for polarization measurement in soft X-ray region

Imazono¹,

Suzuki²,

Sano³

et al. 2010

Spectrochimica Acta Part B: Atomic Spectroscopy

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“…Они способны отражать, фокусировать и монохроматизировать МРИ при различных углах вплоть до нормального падения. МРЗ на основе пары материалов W-Si наиболее востребованы для анализа содержания легких элементов (от кислорода до кремния) [8,9], а также переходных металлов 4-го периода Периодической системы элементов, имеющих характеристические спектральные L-линии в области длин волн λ≈1-2 нм. Толщины слоев в таких зеркалах составляют 1-3 нм, а число пар слоев превышает 100.…”

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STRUCTURE AND PHASE COMPOSITION OF W-Si MULTILAYER X-RAY MIRRORS

Pershyn

Shipkova

Devizenko

et al. 2018

EEJP

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X-ray diffractometry in a hard region (l~0.154 nm) was used to study the phase structure, composition and construction of W/Si multilayer X-ray mirrors (MXMs) with thicknesses of tW<10 nm for tungsten layers obtained by direct-current magnetron sputtering. Two series of samples were fabricated with different tungsten deposition rates, which differ approximately by a factor of 4: ~0.60 nm/s and ~0.15 nm/s. It is shown that tungsten layers have a polycrystalline (BCC) structure at thicknesses tW>2.7 nm, and at tW<1.9 nm they are amorphous. Using the sin2Y-method, it was found that in thin crystalline layers of tungsten (tW<10 nm), more than 3 at.% Si can be contained. Tensile stresses in the layers of crystalline tungsten do not exceed 1.1 GPa. The construction of the radial distribution functions of atoms made it possible to establish that amorphous layers of tungsten have an arrangement of atoms close to b-W. In all samples, formation of silicide interlayers is observed at the interfaces, as a result of which the actual thickness of the tungsten layers is less than the nominal one. Amorphous silicide layers, necessarily formed at the stage of MXM manufacturing, contain tungsten disilicide. Depending on the deposition rate, disilicide can have an arrangement of atoms close to either the tetragonal phase, t-WSi2 (~0.6 nm/s), or to the hexagonal phase, h-WSi2 (~0.15 nm/s). An improved model for the construction of amorphous W/Si MXMs is presented. Mechanisms for the formation of silicide layers are proposed, according to which the bottom silicide interlayers (W-on-Si) are formed mainly by ballistic mixing of tungsten and silicon atoms, and the top ones due to diffusion inermixing. The interdiffusion coefficients were estimated, which made it possible to establish that the deposited surface of the layers can be heated at least 250° above the substrate temperature. The ways of reducing the interface interaction are suggested.

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Reflectance and Resolution of Multilayer Monochromators for Photon Energies from 400 – 6000 eV

Cited by 11 publications

References 0 publications

Synchrotron beamline optics for X-ray powder diffraction under high-pressure conditions at the Siam Photon Laboratory

Synchrotron beamline optics for X-ray powder diffraction under high-pressure conditions at the Siam Photon Laboratory

Design of an apparatus for polarization measurement in soft X-ray region

STRUCTURE AND PHASE COMPOSITION OF W-Si MULTILAYER X-RAY MIRRORS

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