“…Among these, ZnGeN 2 and ZnSiN 2 and alloys of ZnSi x Ge 1−x N 2 were grown in thin film form (mostly on sapphire substrates) by a few different approaches, ranging from Cl based vapor growth [3], metalorganic chemical vapor deposition (MOCVD) [8,9], remote plasma MOCVD [10,11,12], RF-sputtering [13] at high pressure by Endo et al [2] and polycrystalline as well as small single crystals were grown by Du et al [14]. Raman spectra were measured by Viennois et al [15] on polycrystalline powders and on small single crystal needles by Peshek et al [16] Optical absorption [17], index of refraction [18], infrared reflectivity [19], magnetic properties upon Mn doping [20], and fabrication of transistors on SiC [21] were investigated for the Zn(Si,Ge)N 2 films obtained produced by Zhu et al [8]. Band structure calculations at the local density approximation (LDA) level were carried out by Limpijumnong et al [22] Misaki et al [23], Shaposhnikov et al [24] and Paudel [25] for a number of these materials but leave considerable uncertainty on the band gaps because of the shortcomings of the LDA.…”