1997
DOI: 10.1063/1.363888
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Relationship between carrier diffusion lengths and defect density in hydrogenated amorphous silicon

Abstract: Defect density and atomic bond structure of tetrahedral amorphous carbon (ta-C) films prepared by filtered vacuum arc process

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Cited by 18 publications
(6 citation statements)
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“…Typically, (mt) maj increases with decreasing E c À E f [39] accompanied by a decrease in (mt) min . This anticorrelated behavior is also seen when the electrons are the minority carriers in p-type a-Si:H, where (mt) min decreases with increasing E c À E f > 0.8 eV [36,40,41,46].…”
Section: Fermi-level Positionmentioning
confidence: 71%
See 1 more Smart Citation
“…Typically, (mt) maj increases with decreasing E c À E f [39] accompanied by a decrease in (mt) min . This anticorrelated behavior is also seen when the electrons are the minority carriers in p-type a-Si:H, where (mt) min decreases with increasing E c À E f > 0.8 eV [36,40,41,46].…”
Section: Fermi-level Positionmentioning
confidence: 71%
“…Sakata et al [46] argued that errors have been made in the determination of L by Wang and Schwarz [45] because the measured L by SSPG should be corrected. They maintain that there is a drop in the true diffusion length also in the initial stages of degradation.…”
Section: Defects and Light-induced Degradationmentioning
confidence: 99%
“…Here, we scanned the monitor height with its width unchanged (i.e., P = 380 nm) in the single‐pass case and obtained L abs = 261.5 and 90.6 nm in our solar cell [Figure (a)] and in the conventional planar one [Figure (b)]. As mentioned before, the hole diffusion length is only 50 nm after light soaking , which throughout the paper is set to the a‐Si:H layer thickness to avoid significant Staebler–Wronski effect . It is clearly seen that L abs is about 4.23 times (only about 0.81 times) larger than the hole diffusion length in our solar cell design (in the conventional planar design).…”
Section: Simulation Results and Discussionmentioning
confidence: 87%
“…The p‐i‐n a‐Si:H layers are deposited in sequence on the TCO electrode, whose nanopattern is assumed to be uniformly transformed into the a‐Si:H layers. In this paper, the a‐Si:H layer thickness, h Si , is set to 50 nm, i.e., h Si = 50 nm, which is equal to the hole diffusion length after light soaking with assumption of an average defect density of about 1 × 10 16 cm ‐3 due to the dangling bonds in the a‐Si:H layers . In this case, the photocarriers generated in the i‐type region can completely transport to the n‐type and p‐type regions of the a‐Si:H layers, and thus the light‐induced Staebler–Wronski effect can be reduced efficiently.…”
Section: Structure and Numerical Simulation Methodsmentioning
confidence: 99%
“…For good collection, thickness of device should be lesser than drift length ( ). For example, amorphous silicon has very low diffusion length [126][127][128], hence it's not possible to have 100 micrometer thick films. Nevertheless amorphous silicon has high absorption coefficient and thin film solar cells with thickness ~ 1um can be made using PIN structures.…”
Section: Field Based Collectionmentioning
confidence: 99%