2007
DOI: 10.1016/j.tsf.2007.07.145
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Relationships between material properties of piezo-electric thin films and device characteristics of film bulk acoustic resonators

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Cited by 19 publications
(8 citation statements)
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“…The reactive sputtering process, employed for depositing AlN, requires careful control of the sputtering pressure at 1 Pa and nitrogen gas concentration (50% N 2 /Ar) to ensure alignment in the (0002) direction [41]. X-ray diffraction (XRD) analysis of our fabricated structure confirmed the successful deposition of the AlN film in the correct orientation, as indicated by the strong intensity peak at the 2θ position of around 36 degrees in Figure 5, corroborating the perpendicular alignment of the film relative to the cantilever beam's surface [41][42][43]. The final step in the device fabrication involved forming a cylindrical oscillator using a 3D printer.…”
Section: Fabrication and Characterization Of Mems Energy Harvester An...supporting
confidence: 60%
“…The reactive sputtering process, employed for depositing AlN, requires careful control of the sputtering pressure at 1 Pa and nitrogen gas concentration (50% N 2 /Ar) to ensure alignment in the (0002) direction [41]. X-ray diffraction (XRD) analysis of our fabricated structure confirmed the successful deposition of the AlN film in the correct orientation, as indicated by the strong intensity peak at the 2θ position of around 36 degrees in Figure 5, corroborating the perpendicular alignment of the film relative to the cantilever beam's surface [41][42][43]. The final step in the device fabrication involved forming a cylindrical oscillator using a 3D printer.…”
Section: Fabrication and Characterization Of Mems Energy Harvester An...supporting
confidence: 60%
“…There is a considerable relationship between surface roughness and the electromechanical coupling coefficient; low surface roughness leads to higher values of electromechanical coupling coefficient . Figure shows the 1 × 1 μm 2 AFM scan for AlN films deposited on two different types of metallic seed layers.…”
Section: Resultsmentioning
confidence: 99%
“…Moreover, ZnO has remarkable physical properties such as a wide optical band gap (3.37 eV), high n-type conductivity, and relatively low electron concentration (10 18 -10 19 cm À 3 ) compared to indium tin oxide (ITO, 10 21 cm À 3 ). [2] Owing to these prominent properties, zinc oxide has been used for the fabrication of room temperature UV laser diodes, [3] piezoelectric transducers, [4] thin film bulk acoustic resonator (FBAR) filters, [5] light-emitting diodes (LEDs), [6] optical waveguides, [7] thin-film transistors, [8] and nano-generators. [9] Several techniques, including sputtering, [10] chemical vapor deposition, [11] atomic layer deposition (ALD), [12] chemical solution deposition, [13] and thermal evaporation, [14] have been used for the synthesis of ZnO thin films.…”
Section: Introductionmentioning
confidence: 99%
“…With the strategy mentioned above, we synthesized six new zinc complexes, namely, [Zn(dmamp (5), and [Zn-(dmamb)(hfac)] 2 (6), as potential precursors for the fabrication of ZnO thin films. The newly synthesized heteroleptic complexes were characterized by nuclear magnetic resonance (NMR) spectroscopy, Fourier transform infrared spectroscopy, elemental analysis (EA), thermogravimetric analysis (TGA), and single crystal X-ray diffraction.…”
Section: Introductionmentioning
confidence: 99%