2015
DOI: 10.1016/j.spmi.2015.05.034
|View full text |Cite
|
Sign up to set email alerts
|

Reliability analysis of charge plasma based double material gate oxide (DMGO) SiGe-on-insulator (SGOI) MOSFET

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2016
2016
2022
2022

Publication Types

Select...
3
2
1

Relationship

1
5

Authors

Journals

citations
Cited by 9 publications
(2 citation statements)
references
References 20 publications
0
2
0
Order By: Relevance
“…Nevertheless, availability of few challenges is trivial even if many advantages are there [18]. The major issue for this SHS hybrid device is the total gate capacitance, which further degrades f T , and speed of the device.…”
Section: Performance Evaluationmentioning
confidence: 99%
“…Nevertheless, availability of few challenges is trivial even if many advantages are there [18]. The major issue for this SHS hybrid device is the total gate capacitance, which further degrades f T , and speed of the device.…”
Section: Performance Evaluationmentioning
confidence: 99%
“…[64][65][66] CP based p-n diode (exp.) [60,61], BJTs [62,95,111,112], TFET [63], IMOS [113], Junctionless transistor [114], Biristor [115], SiGe-on-insulator MOSFET [116], graded channel MOSFET [117] EH bilayer TFET [79,80], EH bilayer TFET (exp.) [81], virtual diode (exp.)…”
Section: Vertical P-n Junction: Electron-hole Bilayer (Ehb)mentioning
confidence: 99%