Flexible a-IGZO thin film transistors (TFTs) have been successfully demonstrated on 50 um thick freestanding polyimide (PI) with µsat around 10 cm2/V-s. In the literature, common characterization of flexible TFTs consist of measuring their electrical response at different bending radius or under positive and negative gate bias stress (PBS and NBS). However, there are few studies where the flexible TFTs have been measured with a simultaneous mechanical and electrical stress. In this work, simultaneous testing under electrical and mechanical stress were carried out with a gate bias stress voltage of ±6 V during 3600 s, and with a tensile bending radius of 1, 2 and 4 mm. a-IGZO TFTs bottom gate-top contacts were fabricated on commercial Kapton HN polyimide by a complete photolithography process. All the PBS and NBS characteristics presented an abnormal threshold voltage left shift which was mainly explained by the adsorption/desorption of water molecules at the back channel. This Vth shift was modeled with the stretched exponential equation. Analyzed TFTs were stable under simultaneous stress until a 4 mm bending radius with electrical parameters Vth, SS, µsat and Ion/Ioff in the order of 0.7 V, 340 mV/dec, 6 cm2/V-s and 5 x108, respectively.