2013
DOI: 10.1016/j.tsf.2012.06.030
|View full text |Cite
|
Sign up to set email alerts
|

Reliability evaluation on a submicron Ni(P) thin film for lead-free soldering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2013
2013
2018
2018

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 21 publications
(1 citation statement)
references
References 14 publications
0
1
0
Order By: Relevance
“…Ni-based UBM has been intensely investigated as a diffusion barrier between Sn and Cu, including electroless nickel immersion gold (ENIG), electroplated Ni-P, Ni-Cu-P, and Ni-Zn-P [14][15][16][17][18][19][20][21][22][23][24][25]. During soldering with Ni-based UBM, the formation of columnar Ni 3 P accelerates interfacial reaction, and voids appear in Ni 3 P. Due to the voids, the interface is weakened and reliability of solder joints is degraded [14,16,17,25].…”
Section: Introductionmentioning
confidence: 99%
“…Ni-based UBM has been intensely investigated as a diffusion barrier between Sn and Cu, including electroless nickel immersion gold (ENIG), electroplated Ni-P, Ni-Cu-P, and Ni-Zn-P [14][15][16][17][18][19][20][21][22][23][24][25]. During soldering with Ni-based UBM, the formation of columnar Ni 3 P accelerates interfacial reaction, and voids appear in Ni 3 P. Due to the voids, the interface is weakened and reliability of solder joints is degraded [14,16,17,25].…”
Section: Introductionmentioning
confidence: 99%