2017
DOI: 10.1177/0954405417718595
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Removal mechanism of 4H- and 6H-SiC substrates (0001 and 0001¯) in mechanical planarization machining

Abstract: This article describes the mechanical planarization machining of SiC substrates involving the Si face (0001) and C face ( 000 1 ¯ ) of N-type (doping nitrogen) 4H-SiC, N-type 6H-SiC, and V-type (doping vanadium) 6H-SiC with a sol–gel polishing pad. The polishing results indicate that the C face, which has a surface roughness of less than 2 nm, is smoother than the Si face (>10 nm), and the material removal rate of the C face is higher than that of the Si face. The removal mechanism of SiC substrates was … Show more

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Cited by 40 publications
(21 citation statements)
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“…The ultra-precision machining technology , is one of the effective methods to achieve non-destructive machining. The ultra-hardness and brittleness of 6H-SiC , and the damage caused by defects such as crystal fracture, crystalline transformation, dislocation slip, and microcracking during reworking affect the performance of machined parts. The temperature gradient of friction, friction parameters, and parameter changes of residual stresses can affect the surface deformation damage of 6H-SiC to different degrees.…”
Section: Introductionmentioning
confidence: 99%
“…The ultra-precision machining technology , is one of the effective methods to achieve non-destructive machining. The ultra-hardness and brittleness of 6H-SiC , and the damage caused by defects such as crystal fracture, crystalline transformation, dislocation slip, and microcracking during reworking affect the performance of machined parts. The temperature gradient of friction, friction parameters, and parameter changes of residual stresses can affect the surface deformation damage of 6H-SiC to different degrees.…”
Section: Introductionmentioning
confidence: 99%
“…However, SiC is a typical difficult-to-machine material due to its high hardness and strong chemical inertness. The subsurface damage (SSD) is easily caused during substrate processing [6], which will impair the mechanical, electronic, and optical properties of materials [7]. For this reason, the characterization of subsurface damage is conducive to advanced applications.…”
Section: Introductionmentioning
confidence: 99%
“…Ma et al [21] researched the nanoindentation behavior of polycrystalline 3C-SiC thin films exhibiting columnar microstructures by acoustic emission signal monitoring and time-frequency spectrum analysis. Lu et al [22] studied 6H-SiC substrate characteristics by means of nanoindentation and found that the C face is easier to remove than the Si face during mechanical planarization machining. Datye et al [23] evaluated the fracture toughness and plastic behavior of 6H-SiC single crystal by nanoindentation.…”
Section: Introductionmentioning
confidence: 99%