Removal of hydrogen from 2H::Si(100) by sputtering and recoil implantation:

Tesauro, Mark R.; Underwood, Grant; Banerjee, Sanjay K.; Campion, Alan

doi:10.1016/s0039-6028(98)00452-x

Surface Science

1998

DOI: 10.1016/s0039-6028(98)00452-x

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Removal of hydrogen from 2H::Si(100) by sputtering and recoil implantation:

Mark R. Tesauro

Grant Underwood

Sanjay K. Banerjee

et al.

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Removal of hydrogen from 2H::Si(100) by sputtering and recoil implantation:

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References 25 publications

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