2019
DOI: 10.1021/acsami.9b05553
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Replication of a Tissue Microenvironment by Thermal Scanning Probe Lithography

Abstract: Thermal scanning probe lithography (t-SPL) is a nanofabrication technique in which an immobilized thermolabile resist, such as polyphthalaldehyde (PPA), is locally vaporized by a heated atomic force microscope tip. Compared with other nanofabrication techniques, such as soft lithography and nanoimprinting lithography, t-SPL is more efficient and convenient as it does not involve time-consuming mask productions or complicated etching procedures, making it a promising candidate technique for the fast prototyping… Show more

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Cited by 18 publications
(24 citation statements)
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“…Immunostaining and transfection. Immunofluorescence conducted was based on the protocol recently described by Tang et al 72 . The cells were cultured in the migration chips for 24 h, followed by treatment and migration for 8 h then fixed in freshly prepared 4% paraformaldehyde (PFA) at room temperature for 15 min.…”
Section: Cell Seeding Into Migration Chip With Microchannelsmentioning
confidence: 99%
“…Immunostaining and transfection. Immunofluorescence conducted was based on the protocol recently described by Tang et al 72 . The cells were cultured in the migration chips for 24 h, followed by treatment and migration for 8 h then fixed in freshly prepared 4% paraformaldehyde (PFA) at room temperature for 15 min.…”
Section: Cell Seeding Into Migration Chip With Microchannelsmentioning
confidence: 99%
“…Human mesenchymal stem cells adhered, spread and proliferated on these PPA nanostructures. This experiment demonstrates the capabilities of t-SPL and PPA for the study of cell-matrix interactions, including rapid prototyping of biocompatible scaffolds 59 .…”
Section: Tailored Topographies For Guiding and Assembly Of Microobjecmentioning
confidence: 80%
“…The example of molecular glass resists shows that a few additional requirements need to be considered for a t-SPL resist to be suited for general nanofabrication: 59 or be used to guide and trap nanoparticles 56,57,58 . After assembly, the PPA resist can be removed by heating 55 .…”
Section: Requirements For T-spl Resists For Direct Permanent Removalmentioning
confidence: 99%
“…According to the tip‐sample interaction used to define the lithographic pattern (i.e., mechanical, thermal, diffusive and electrical), SPL approaches can be classified in: i) Mechanical SPL (m‐SPL) : this technique creates patterns on the surface of samples by removing the materials selectively. The process of patterns' formation mainly relies on the strong contact force between the tip and the sample . ii) Thermal SPL (t‐SPL) : this technique uses a heating probe to alter the properties of the sample locally .…”
Section: Spm‐based Lithographymentioning
confidence: 99%