Research on edge-control methods in CNC polishing

Yu, Guoyu; Walker, David D.; Li, Hongyu; Zheng, Xiao; Beaucamp, Anthony

doi:10.1186/s41476-017-0053-9

Cited by 9 publications

(3 citation statements)

References 10 publications

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“…Based on the Preston equation, this analysis aims to predict the shape of the edge contour. Yu [17] showcased, through a simulation and experiments, that superior edge quality can be achieved by locally rectifying hexagonal optical lenses using small tools compared to machining large surfaces. Others have improved the edge effect by controlling the machining process.…”

Section: Introductionmentioning

confidence: 99%

Study of Modified Offset Trajectory for Bonnet Polishing Based on Lifting Bonnet Method

Sha,

Ma,

Han

et al. 2023

Micromachines

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The inability to converge at the edge of a workpiece during polishing affects the edge profile accuracy and surface quality of the workpiece. In this study, a bias trajectory generation method based on the lifting bonnet method that can maintain the morphology of polished edges is presented. Firstly, by establishing the polishing parameters and the decreasing rule in line with the principles of the lifting bonnet method, we obtained the residual height spacing, the radius of the polishing area, the centre offset position, and the pressing depth for each offset trajectory. Subsequently, the modified bias trajectory algorithm correction coefficients were obtained by fitting the edge trajectories using cubic Bessel curves, which were multiplied with the bias amount to obtain the final modified bias trajectory. Finally, an experiment was designed to compare the edge effect of the modified bias trajectory with the traditional grating trajectory. The experimental findings indicate that the reduction in edge collapse following the implementation of the modified offset trajectory was 1.30 μm. In contrast, the edge collapse after polishing with the traditional grating trajectory amounted to 98.67 μm. Moreover, the edge collapse ensuing traditional polishing trajectory was 75.9 times more pronounced than that observed after using the modified offset trajectory. It is shown that the modified bias trajectory method can not only maintain the original edge morphology of the workpiece but can also promote the convergence of the edge effect to a certain extent.

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Section: Introductionmentioning

confidence: 99%

Study of Modified Offset Trajectory for Bonnet Polishing Based on Lifting Bonnet Method

Sha,

Ma,

Han

et al. 2023

Micromachines

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“…Surveys such as that conducted by W. Song [11] have shown that the generalized spatial variable deconvolution algorithm can accurately calculate the dwell time, which can better control the actual removal amount so as to effectively suppress the edge error and improve the convergence rate. Based on the errors distribution on the workpiece, Yu et al [12] developed a new tool running path, which not only reduces residual errors on the edges but also the total polishing time.…”

Section: Introductionmentioning

confidence: 99%

Edge Control in the Computer-Controlled Optical Surface

Yin

Guan

et al. 2021

Micromachines

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The computer-controlled optical surface (CCOS) can process good optical surfaces, but its edge effect greatly affects its development and application range. In this paper, based on the two fundamental causes of the CCOS’s edge effect—namely the nonlinear variation of edge pressure and the unreachable edge removal—a combined polishing method of double-rotor polishing and spin-polishing is proposed. The model of the combined polishing method is established and theoretically analyzed. Combined with the advantages of double-rotor polishing and spin-polishing, the combined polishing process can achieve full-aperture machining without pressure change. Finally, the single-crystal silicon sample with a diameter of 100 mm is polished by the combined polishing process. The results show that, compared with the traditional CCOS polishing, the residual error of the sample after the combined polishing process is more convergent, and the edge effect is effectively controlled.

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“…The proposed method has better precision and robustness in scenarios of spectral aliasing or non-periodic apodization and potential applicability in various aspects of digital holography, interferometry, surface metrology, etc. [19][20][21][22]. This paper introduces the theory behind the method, analyzes the accuracy and adaptability with numerical simulations and experiment.…”

Section: Introductionmentioning

confidence: 99%

Advanced method of global phase shift estimation from two linear carrier interferograms

Sun

Wang

Zhao

et al. 2018

J. Eur. Opt. Soc.-Rapid Publ.

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Background: Phase-shifting interferometry is a kind of important technique used in optical interference metrology. This technique has high precision and good stability, which has been widely used in scientific research and industrial production. Methods: This paper proposes a new method to estimate global phase shift from two interferograms. This method performs algebraic calculation of two interferograms with the assistance of Hilbert transform. An iterative approach is used for the attempted phase to ensure that the minimum of assessment function is obtained. Results: The simulated result indicate that the maximum calculation error of the global phase-shifting is 1.5%. And then we use experimental data to verify the performance of this method. Conclusions: The method proposed in this article is simple but precise, and can cope with interferograms with uneven background and modulation, non-periodic apodization, and random noises. It does not require any specific carrier frequency of the measured interferogram or any adjustment of range of integration in accordance with the carrier frequency.

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Research on edge-control methods in CNC polishing

Cited by 9 publications

References 10 publications

Study of Modified Offset Trajectory for Bonnet Polishing Based on Lifting Bonnet Method

Study of Modified Offset Trajectory for Bonnet Polishing Based on Lifting Bonnet Method

Edge Control in the Computer-Controlled Optical Surface

Advanced method of global phase shift estimation from two linear carrier interferograms

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