Residual stress and laser-induced damage of ion-beam sputtered Ta2O5/SiO2 mixture coatings

Qiao, Zhao; Pu, Yong; Líu, Hao; Luo, Kun; Wang, Gang; Liu, Zhichao; Ma, Ping

doi:10.1016/j.tsf.2015.06.023

Cited by 7 publications

(3 citation statements)

References 13 publications

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“…The stresses during the laser writing process in silica achieve 2 GPa [5]. The laser-induced compressive stress in silicon dioxide films, deposited by ion beam sputtering, achieve 1.6 GPa in the normal conditions of radiation at 1064 nm wavelength and a pulse duration of 5 ns [23]. The intensity of the laser irradiation in [24] is a laser-induced damage threshold of about 25 J/cm 2 .…”

Section: E(si) →mentioning

confidence: 99%

Laser-Induced Thermal Stresses in Dense and Porous Silicon Dioxide Films

2021

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The laser-induced thermal stresses in silicon dioxide films are calculated using molecular dynamics simulations. The absorption of the laser energy is simulated by the linear temperature growth from room temperature to 1300 K in a time equal to the laser pulse duration. The maximum values of stresses for picosecond pulses are approximately twice as high as for nanosecond pulses. The stresses in highly porous glancing angle deposited films are approximately two times lower than in dense films. Stress waves caused by picosecond pulses are observed in dense films. An increase in the heating temperature to 1700 K leads to an increase in the absolute stress values for picosecond pulses, and a decrease for nanosecond pulses.

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Section: E(si) →mentioning

confidence: 99%

Laser-Induced Thermal Stresses in Dense and Porous Silicon Dioxide Films

2021

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“…Due to the good optical properties, chemical stability [11], and high refractive index in the visible and near-infrared regions [12,13]. Ta 2 O 5 coatings have been widely used as high-performance materials in semiconductors [14], data storage systems, and optical devices [15,16]. In addition to the above optical properties, Ta 2 O 5 coatings also have mechanical properties, such as good wear resistance [17] and high hardness [18], which can be used as protective coatings.…”

Section: Introductionmentioning

confidence: 99%

Effect of Nitrogen Flow Rate on Microstructure and Optical Properties of Ta2O5 Coatings

Chao

Cai

et al. 2022

Coatings

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Ta2O5 coatings were prepared on highly transparent quartz glass and silicon wafer substrates using RF magnetron sputtering technology. Different flow rates (10%, 15%, and 20%) of N2 were introduced during the sputtering process while keeping the total sputtering gas flow rate constant at 40 sccm. The effects of N2 flow rate on the phase structure, micro-morphology, elemental composition, and optical properties of Ta2O5 coatings were investigated. The coatings were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), atomic force microscopy (AFM), electron energy spectroscopy (EDS), and spectrophotometry. The results show that the phase composition of the coating is an amorphous structure when the sputtering gases are pure argon and nitrogen-argon mixed gases, respectively. The coating after the passage of N2 is mainly composed of Ta, N, and O, which confirms that the deposited coating is a composite coating of Ta oxide and nitride. The EDS spectrum indicates that the ratio of O to Ta atoms in the composite coating is greater than the stoichiometric value of 2.5. It may be related to the deposition rate of Ta atoms during the preparation process. The optical properties show that the average transmittance of the composite coating is greater than 75% and the maximum light transmission is 78.03%. The transmittance in the visible range of Ta2O5 coatings prepared under nitrogen-argon mixed gas sputtering conditions is greater than that of those prepared under pure argon sputtering conditions. Finally, the coatings optical direct band gap Edg and indirect band gap Eig are obtained.

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“…Due to good optical properties in the visible and near-infrared regions, thermal and chemical stability, and high refractive index, Ta 2 O 5 has been widely used as a high refractive index material in fine optical coatings [18,19]. Many studies show that Ta 2 O 5 films fabricated by IBS exhibit high compressive stress [20,21].…”

Section: Introductionmentioning

confidence: 99%

Effects of Annealing on Residual Stress in Ta2O5 Films Deposited by Dual Ion Beam Sputtering

Huang

Zhang

et al. 2018

Coatings

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Optical coatings deposited by the dual ion beam sputtering (DIBS) method usually show high compressive stress, which results in severe wavefront deformation of optical elements. Annealing post-treatment has been widely used to control the residual stress of optical coatings. However, the effect of annealing on the stress of Ta 2 O 5 films deposited by the IBS method has not been reported in detail. In this study, different thicknesses of Ta 2 O 5 films were deposited by IBS and annealed at different temperatures from 473 to 973 K in air, and the effect of annealing on the stress of Ta 2 O 5 films was investigated. The as-deposited Ta 2 O 5 films deposited by IBS show high compressive stress, which are about 160 MPa. The compressive stress decreases linearly with the increasing temperature, and the wavefront deformation of Ta 2 O 5 films increases linearly with film thickness (within 20 µm) at the same annealing temperature. When the temperature rises to 591 K, Ta 2 O 5 films with zero-stress can be obtained. Ta 2 O 5 films show tensile stress instead of compressive stress with further increasing annealing temperature, and the tensile stress increases with increasing temperature. Meanwhile, with the increasing annealing temperature, the refractive index of Ta 2 O 5 film decreases, indicating the decreasing packing density. The atomic force microscope (AFM) test results show that surface roughness of Ta 2 O 5 films slowly increases with the increasing of annealing temperature. Moreover, X-ray photoelectron spectroscopy (XPS) analysis shows that the Ta in Ta 2 O 5 films can be further oxidized with increasing annealing temperature, namely, the absorption of Ta 2 O 5 film can be reduced. X-ray diffraction (XRD) analysis shows that the annealing temperature should be below 923 K to maintain the amorphous structure of the Ta 2 O 5 film.

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Residual stress and laser-induced damage of ion-beam sputtered Ta2O5/SiO2 mixture coatings

Cited by 7 publications

References 13 publications

Laser-Induced Thermal Stresses in Dense and Porous Silicon Dioxide Films

Laser-Induced Thermal Stresses in Dense and Porous Silicon Dioxide Films

Effect of Nitrogen Flow Rate on Microstructure and Optical Properties of Ta2O5 Coatings

Effects of Annealing on Residual Stress in Ta2O5 Films Deposited by Dual Ion Beam Sputtering

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