1969
DOI: 10.1007/bf02319696
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Residual stresses in evaporated AI-Si films

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Cited by 2 publications
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“…Among various strategies, in Fig. 1e, we summarize several "indirect" mechanisms or techniques used as the stimuli of kirigami/origami, such as capillary forces [34][35][36][37][38][39][40][41][42][43][44] , residual stress [45][46][47][48][49][50][51][52][53][54] , mechanical forces [55][56][57][58][59][60][61] , responsive materials [62][63][64][65][66][67][68][69][70][71][72][73] , and ion-beam irradiation stress [74][75][76][77][78][79][80][81][82]…”
Section: Microscale/nanoscale Kirigami/origami With Prescribed Patternsmentioning
confidence: 99%
“…Among various strategies, in Fig. 1e, we summarize several "indirect" mechanisms or techniques used as the stimuli of kirigami/origami, such as capillary forces [34][35][36][37][38][39][40][41][42][43][44] , residual stress [45][46][47][48][49][50][51][52][53][54] , mechanical forces [55][56][57][58][59][60][61] , responsive materials [62][63][64][65][66][67][68][69][70][71][72][73] , and ion-beam irradiation stress [74][75][76][77][78][79][80][81][82]…”
Section: Microscale/nanoscale Kirigami/origami With Prescribed Patternsmentioning
confidence: 99%