2016
DOI: 10.1088/0022-3727/49/18/185302
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Resistive switching and magnetic behavior of Bi0.8Ba0.2FeO3 / SrRuO3 / SrTiO3films: role of thickness-dependent strain

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Cited by 14 publications
(4 citation statements)
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“…The results indicated that lots of OVs exist in SSO films and the concentrations of OVs increase with the decrease of the growth oxygen pressures. The same phenomena were also observed in Sn-doped In 2 O 3 and Bi 0.8 Ba 0.2 FeO 3 films. , …”
Section: Results and Discussionsupporting
confidence: 76%
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“…The results indicated that lots of OVs exist in SSO films and the concentrations of OVs increase with the decrease of the growth oxygen pressures. The same phenomena were also observed in Sn-doped In 2 O 3 and Bi 0.8 Ba 0.2 FeO 3 films. , …”
Section: Results and Discussionsupporting
confidence: 76%
“…The same phenomena were also observed in Sn-doped In 2 O 3 and Bi 0.8 Ba 0.2 FeO 3 films. 40,42 Figure 4a shows the transmittance spectra in the wavelength range of 200−2000 nm for SSO films deposited on LAO substrates at various oxygen pressures. The spectra show that all of the SSO films have an optical transmittance of more than 75% in the visible and near-infrared wavelength region, even for the film deposited at 2 × 10 −3 Pa oxygen pressures.…”
Section: Resultsmentioning
confidence: 99%
“…Among the different materials that exhibit the RS phenomenon, intensive research is being devoted to RS phenomena in transition metal oxides [63,84,93,94,102,135,[142][143][144][145][146][147][148]. In transition metal oxides, the mobility of oxygen-related defects, typically oxygen vacancies, is much higher than that of cations [7].…”
Section: Oxidesmentioning
confidence: 99%
“…For in-memory computing purposes, the cycling endurance of memory devices is among the highest priorities. BRS devices, in which the switching process relies purely on the migration of atoms/ions along the CF only [95,135,146,147], are considered more reliable than URS devices and show better uniformity and cycling endurance. Further, mat erial engineering may play an important role in achieving a large resistance window between the LRS and HRS and thus in enlarging the read margin, which can lead to the development of scalable RRAM-based devices.…”
Section: Challengesmentioning
confidence: 99%