“…Intensive efforts have been devoted to overcome aforementioned challenges of RS parameters and to nd out actual physical mechanism. For this purpose, many approaches, such as metal doping, [14][15][16][17] embedding metal nanoparticles, 18,19 bilayer structure, [20][21][22] as well as annealing atmosphere treatment, [23][24][25][26] have been adopted to minimize the challenges. Among them, annealing atmosphere treatment is not only good compatibility with CMOS process, but also a feasible and effective way to improve the performance and reliability of RRAM devices.…”