2018
DOI: 10.7567/jjap.57.06hc03
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Resistive switching characteristics of manganese oxide thin film and nanoparticle assembly hybrid devices

Abstract: Improved resistive switching characteristics are demonstrated in a hybrid device with Pt/Ti/MnO (thin film)/MnO (nanoparticle)/Pt structure. The hybrid devices of MnO thin film and nanoparticle assembly were fabricated. MnO nanoparticles with an average diameter of ∼30 nm were chemically synthesized and assembled as a monolayer on a Pt bottom electrode. A MnO thin film of ∼40 nm thickness was deposited on the nanoparticle assembly to form the hybrid structure. Resistive switching could be induced by the format… Show more

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Cited by 21 publications
(8 citation statements)
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“…28,29) The currents in the lower voltage regions (<+0.2 V, >−0.24 V) at HRS before SET and after RESET followed a linear dependence on voltage, which was resulted from the thermally generated free carriers at low-voltage. 30) And, as shown in Figs. 5(a) and 5(c), linear relations of logI ∝ V 0.5 were exhibited in the high-voltage regions (>+0.2 V, < −0.24 V) at HRS.…”
Section: Resultsmentioning
confidence: 86%
“…28,29) The currents in the lower voltage regions (<+0.2 V, >−0.24 V) at HRS before SET and after RESET followed a linear dependence on voltage, which was resulted from the thermally generated free carriers at low-voltage. 30) And, as shown in Figs. 5(a) and 5(c), linear relations of logI ∝ V 0.5 were exhibited in the high-voltage regions (>+0.2 V, < −0.24 V) at HRS.…”
Section: Resultsmentioning
confidence: 86%
“…The electroforming process is a phenomenon of resistive memories where the initial conductive filaments begin to grow by the progression of oxidized metal ions migration within the insulating medium by the application of applied voltage. [ 56 ] As a result of the continuous growth of these filaments, the top and bottom conducting electrodes connect together by virtue of which the insulating high resistance (OFF) state changes to conductive low resistance (ON) state. It is usually a preparatory step in most of the memristors before the actual switching cycles and voltages for SET (ON) and RESET (OFF) are observed.…”
Section: Resultsmentioning
confidence: 99%
“…RRAM offers easy fabrication and high-density memory owing to a simple metal-insulator-metal (MIM) structure. Each memory cell compromises a switching material (insulator/semiconductor) sandwiched between two metal electrodes [ 7 , 8 ]. Due to the simple structure, it also offers the best scalability features.…”
Section: Introductionmentioning
confidence: 99%