High-Frequency GaN Electronic Devices 2019
DOI: 10.1007/978-3-030-20208-8_8
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Resonant Tunneling Transport in Polar III-Nitride Heterostructures

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Cited by 6 publications
(5 citation statements)
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“…Even though research on nitride resonant tunneling transport started almost two decades ago [9 and 10], in the past three years important breakthroughs have been achieved due to recent advances in epitaxial growth, polar heterostructure design, and device fabrication [11][12][13][14]. In particular, the demonstration of reliable roomtemperature negative differential conductance (NDC) [12][13][14][15][16][17][18] and the first nitride-based resonant tunneling oscillator [19 and 20] have led to a better understanding of resonant tunneling physics through polar semiconductors. These milestones have reignited interest in the development of practical device applications enabled by nitride resonant tunneling injection.…”
Section: Introductionmentioning
confidence: 99%
“…Even though research on nitride resonant tunneling transport started almost two decades ago [9 and 10], in the past three years important breakthroughs have been achieved due to recent advances in epitaxial growth, polar heterostructure design, and device fabrication [11][12][13][14]. In particular, the demonstration of reliable roomtemperature negative differential conductance (NDC) [12][13][14][15][16][17][18] and the first nitride-based resonant tunneling oscillator [19 and 20] have led to a better understanding of resonant tunneling physics through polar semiconductors. These milestones have reignited interest in the development of practical device applications enabled by nitride resonant tunneling injection.…”
Section: Introductionmentioning
confidence: 99%
“…Even though research on nitride resonant tunneling transport started almost two decades ago [9 and 10], in the past three years important breakthroughs have been achieved due to recent advances in epitaxial growth, polar heterostructure design, and device fabrication [11][12][13][14]. In particular, the demonstration of reliable roomtemperature negative differential conductance (NDC) [12][13][14][15][16][17][18], and the first nitride-based resonant tunneling oscillator [19 and 20], have led to a better understanding of resonant tunneling physics through polar semiconductors. These milestones have reignited interest in the development of practical device applications enabled by nitride resonant tunneling injection.…”
Section: Introductionmentioning
confidence: 99%
“…III-Nitride RTD capacitance measured under closeto-equilibrium conditions for the two RTD designs with different contact doping concentrations N + d and N ++ D . Employing our analytical model for polar RTDs we also compute the theoretical RTD capacitance, given by equation (3), for the structure shown in Fig.1(a), while varying the doping concentration between 1×1018 and 1×10 20 cm −3 (blue curves). The agreement between the experimental and theoretical results reveals that polar RTDs behave effectively as parallel-plate capacitors, when the population of the resonant level is negligible.…”
mentioning
confidence: 99%
“…Throughout the whole epitaxial process, we monitor the oscillating intensity of the reflection high-energy electron diffraction pattern to measure-in real time-the incorporation of single monolayers. 22,30) These conditions, allow us to maintain the high structural quality of the single-crystal n-GaN substrates, minimizing the presence of crystalline defects and threading dislocations.…”
mentioning
confidence: 99%