Restoration of the graphitic structure by defect repair during the thermal reduction of graphene oxide

Silva, K. Kanishka H. De; Huang, Hsin‐Hui; Joshi, Rakesh; Yoshimura, Masamichi

doi:10.1016/j.carbon.2020.05.015

Cited by 132 publications

(66 citation statements)

References 97 publications

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“…Due to GO reduction, decrease in sp 2 domain size and transition from sp 2 to sp 3 occurs, which causes some structural defects. [ 32 ] This increase of I D / I G indicates some deterioration of graphitic character. [ 33 ] On the other hand, the I D / I G value of S‐CA‐RGO‐Cu (0.63) is less than the other samples, which proves less structural disorder and defects with much more connective network.…”

Section: Resultsmentioning

confidence: 99%

Reduced Graphene Oxide and Nanoparticles Incorporated Durable Electroconductive Silk Fabrics

Bhattacharjee

MacIntyre

Bahl

et al. 2020

Adv Materials Inter

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with diverse functional properties makes a fabric suitable for smart textiles, which can be well suited for numerous potential applications including protective clothing, health monitoring, wearable motion sensing, sports clothing, personal entertainment, and the Internet of Things. [1,2] Due to these revolutionary prospective applications, in recent times the interest in multifunctional wearable smart textiles has been increasing remarkably. [3] However, the existing smart textile manufacturing technology involves the processing of separately manufactured conductive threads with some complicated and timeconsuming steps like sewing, knitting, weaving, and embroidery. [4] Besides, fabrication of high electroconductive multifunctional fabric with good washing durability by maintaining a facile fabrication method is very challenging. Having extraordinarily high electrical, thermal, mechanical, hydrophobic, and many other significant properties, graphene and its derivatives (graphene oxide, GO and reduced graphene oxide, RGO) [5] have already demonstrated immense capability to be adsorbed (by covalent and hydrogen bond) onto fabrics and fabricated into smart textiles. [2,3,6] Presence of oxygenbearing (negative) functional groups (hydroxyl, carboxyl, and Graphene derivatives have the capability of forming chemical bonding with fabrics and show the potential to be used in smart textiles. However, the challenge is to fabricate highly conductive multifunctional fabric with good washing durability. Herein, reduced graphene oxide (RGO) and silver (Ag)/copper (Cu) nanoparticles (NPs)-coated durable electroconductive silk fabric is fabricated by facile dip and dry method using 3-glycidyloxypropyl trimethoxy silane as coupling agent (CA). Results show that RGO and NPs-coated fabrics not only demonstrate low surface resistance but also excellent electrothermal property, UV shielding, enhanced thermal stability, and outstanding hydrophobicity consistently in the following order: pure silk < silk-RGO < silk-CARGO < silk-CARGO -Ag < silk-CARGO -Cu. The addition of CA and NPs is found to have a significant impact on performance and washing durability. Cu incorporated samples (silk-CARGO -Cu) show a very low value of surface resistance (3.15 kΩ sq −1) and even after washing 20 times, the resistance (6.76 kΩ sq −1) is observed to be lower than unwashed non-Cu incorporated samples. Moreover, silk-CARGO -Cu also has the highest UV resistance, Joule heating, hydrophobicity, and thermal stability among all samples, which makes it well suited for numerous potential applications including protective clothing, health monitoring, motion sensing, and sports clothing.

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Section: Resultsmentioning

confidence: 99%

Reduced Graphene Oxide and Nanoparticles Incorporated Durable Electroconductive Silk Fabrics

Bhattacharjee

MacIntyre

Bahl

et al. 2020

Adv Materials Inter

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“…For attaining graphene-like properties in rGO, significant restoration of the graphitic structure by defect repair is essential. Amongst the available techniques to realize this, the plasma method is one of them, others being the thermally assisted CVD method (>1073 K) and sequential chemical reduction followed by high-temperature graphitization (~2073 K) [ 48 , 142 ]. From environmental, health, and safety aspects, plasma technology has remarkable advantages over chemical and thermal processes [ 143 ].…”

Section: Go/rgo: Properties Reduction Methods and Characterizatimentioning

confidence: 99%

“…Various strategies employed include thermal-CVD [ 92 , 217 , 218 , 219 ] and high-temperature graphitization [ 142 , 220 ]. In a recent review, De Silva et al [ 48 ] addressed the defect repair of GO mostly with thermal methods. This section is devoted to the plasma-enhanced CVD approach, which is more attractive in terms of large-scale applications than the others mentioned.…”

Section: Plasma-assisted Reduction Of Gomentioning

confidence: 99%

“…On the reduction front, specific methods (such as chemical, thermal, eco-friendly, microwave methods, etc. ), as well as an overview of several reduction approaches have been examined [ 42 , 43 , 44 , 45 , 46 , 47 , 48 , 49 , 50 , 51 , 52 , 53 , 54 ]. Amongst these, some reviews have only outlined the plasma method along with other techniques [ 49 , 51 ].…”

Section: Introductionmentioning

confidence: 99%

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Plasma Assisted Reduction of Graphene Oxide Films

2021

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The past decade has seen enormous efforts in the investigation and development of reduced graphene oxide (GO) and its applications. Reduced graphene oxide (rGO) derived from GO is known to have relatively inferior electronic characteristics when compared to pristine graphene. Yet, it has its significance attributed to high-yield production from inexpensive graphite, ease of fabrication with solution processing, and thus a high potential for large-scale applications and commercialization. Amongst several available approaches for GO reduction, the mature use of plasma technologies is noteworthy. Plasma technologies credited with unique merits are well established in the field of nanotechnology and find applications across several fields. The use of plasma techniques for GO development could speed up the pathway to commercialization. In this report, we review the state-of-the-art status of plasma techniques used for the reduction of GO-films. The strength of various techniques is highlighted with a summary of the main findings in the literature. An analysis is included through the prism of chemistry and plasma physics.

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“…Unfortunately, to our knowledge, the dehydroxylation of GO is oen attributed to a thermalinduced process. 38,39 In this work, the NaSH induced a room-temperature reaction to remove the effects of heat treatment. We thus propose the reaction route for the sulfur doping of GO based on the carbonyl groups located at the defects and edges of GO sheets (Scheme 1b): (1) -SH attacks the carbonyl group to generate a hydroxyl and a thiol group; (2) the hydroxyl group leaves to form a stabilized carbocation (p-p conjugation), which will enhance the acidity of C-H; (3) the C-H bond breaks to give a new carbocation; (4) C-SH attacks the carbocation to form a thiophenelike structure.…”

Section: Mechanism Analysismentioning

confidence: 99%

Room-temperature synthesis of water-dispersible sulfur-doped reduced graphene oxide without stabilizers

Guo

Wang

et al. 2020

RSC Adv.

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Restoration of the graphitic structure by defect repair during the thermal reduction of graphene oxide

Cited by 132 publications

References 97 publications

Reduced Graphene Oxide and Nanoparticles Incorporated Durable Electroconductive Silk Fabrics

Reduced Graphene Oxide and Nanoparticles Incorporated Durable Electroconductive Silk Fabrics

Plasma Assisted Reduction of Graphene Oxide Films

Room-temperature synthesis of water-dispersible sulfur-doped reduced graphene oxide without stabilizers

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