2015
DOI: 10.1007/s10854-015-2691-2
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Retarding the Cu–Sn and Ag–Sn intermetallic compounds by applying Cu–xZn alloy on micro-bump in novel 3D-IC technologies

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“…The three-dimensional (3D) integrated circuit (IC) package has attracted considerable attention because of the expected physical limitations in the fabrication of high-scale semiconductor devices (Lee et al , 2013). Because of the compact nature of 3D IC technologies, micro-bump solders are integral components in the packaging of these circuits (Chen et al , 2015). In 3D IC, Cu-Sn bonding was selected as interconnection material, electroplated-evaporation bumping-formed Cu-Sn micro-bumps and purely electroplated Cu-Sn micro-bumps can be used in 3D IC, the microstructural studies on Cu-Sn micro-bumps were carried out to determine the causes for low resistance values after bonding (Murugesan et al , 2012).…”
Section: Introductionmentioning
confidence: 99%
“…The three-dimensional (3D) integrated circuit (IC) package has attracted considerable attention because of the expected physical limitations in the fabrication of high-scale semiconductor devices (Lee et al , 2013). Because of the compact nature of 3D IC technologies, micro-bump solders are integral components in the packaging of these circuits (Chen et al , 2015). In 3D IC, Cu-Sn bonding was selected as interconnection material, electroplated-evaporation bumping-formed Cu-Sn micro-bumps and purely electroplated Cu-Sn micro-bumps can be used in 3D IC, the microstructural studies on Cu-Sn micro-bumps were carried out to determine the causes for low resistance values after bonding (Murugesan et al , 2012).…”
Section: Introductionmentioning
confidence: 99%