2013
DOI: 10.1039/c3ra41277f
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Retracted Article: Utility of plasma: a new road from physics to chemistry

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Cited by 78 publications
(28 citation statements)
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References 245 publications
(262 reference statements)
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“…The mean free path between active species is significant at low pressure, thus, uniform deposition throughout the reactor system can be obtained. Low pressure also increases the glow discharge size rising plasma interaction with the substrate [18][19][20].…”
Section: Influence Of Plasma Parametersmentioning
confidence: 99%
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“…The mean free path between active species is significant at low pressure, thus, uniform deposition throughout the reactor system can be obtained. Low pressure also increases the glow discharge size rising plasma interaction with the substrate [18][19][20].…”
Section: Influence Of Plasma Parametersmentioning
confidence: 99%
“…The rise in flow rate also increases system pressure. Thus, effects associated with high pressure are also dominated by high flow rate as nonuniformity of deposited polymer surface [18][19][20].…”
Section: Influence Of Plasma Parametersmentioning
confidence: 99%
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“…1 Unfortunately, they are subject to several drawbacks: microbial resistance development, damage to the treated scaffold or incomplete sterilization. [3][4][5] Numerous synergies and inactivation mechanisms have been proposed to explain the efficiency of plasma treatments on bacteria suspension, involving the generation of several reactive oxygen and nitrogen species (RONS): hydrogen peroxide, peroxynitrite, ozone or hydroxyl and perhydroxyl radicals among others, with the potential contribution of plasma-issued (V)UV photons. [3][4][5] Numerous synergies and inactivation mechanisms have been proposed to explain the efficiency of plasma treatments on bacteria suspension, involving the generation of several reactive oxygen and nitrogen species (RONS): hydrogen peroxide, peroxynitrite, ozone or hydroxyl and perhydroxyl radicals among others, with the potential contribution of plasma-issued (V)UV photons.…”
mentioning
confidence: 99%