2019
DOI: 10.1117/1.jmm.18.4.040902
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Retrospective on VLSI value scaling and lithography

Abstract: In recent decades, the rate of shrinking integrated-circuit components has slowed as challenges accumulate. Yet, in part by virtue of an accelerating rate of cleverness, the end-user value of new semiconductor processes steadily advances. On top of the miniaturization benefits delivered by optical lithography, value is boosted by innovations in wafer processing, mask synthesis, materials and devices, microarchitecture, and circuit design. Focusing on three decades of microprocessor data enables quantification … Show more

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Cited by 12 publications
(3 citation statements)
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“…In the last decades, the limitations in chip integration to achieve Moore's law density requirements have been overcome through the progressive scaling of the transistor dimensions (particularly channel length) [1,2], the incorporation of high-κ insulators [3] and the design of new device architectures (FinFet, SOI, trigate) [4] to achieve better control of the device performance. The advances in the lithography (deep ultraviolet (DUV) and multi-patterning techniques) have been employed to shrink the dimensions of transistors down-to sub-10 nm channel lengths [2]. However, to support more scaled process technologies, the half-pitch resolution should be improved.…”
Section: Introductionmentioning
confidence: 99%
“…In the last decades, the limitations in chip integration to achieve Moore's law density requirements have been overcome through the progressive scaling of the transistor dimensions (particularly channel length) [1,2], the incorporation of high-κ insulators [3] and the design of new device architectures (FinFet, SOI, trigate) [4] to achieve better control of the device performance. The advances in the lithography (deep ultraviolet (DUV) and multi-patterning techniques) have been employed to shrink the dimensions of transistors down-to sub-10 nm channel lengths [2]. However, to support more scaled process technologies, the half-pitch resolution should be improved.…”
Section: Introductionmentioning
confidence: 99%
“…This approach has also led to an increase in the heat generation density. 1) Heat degrades the reliability and lifetime of ICs. 2) Considerable effort has been put into the design of ICs to alleviate this degradation; consequently, the heat generation density has been leveling off in recent years.…”
Section: Introductionmentioning
confidence: 99%
“…2) Considerable effort has been put into the design of ICs to alleviate this degradation; consequently, the heat generation density has been leveling off in recent years. 1) In order to realize such a design properly and quickly, it is essential to understand the thermal behavior of each component of an IC. Simulations will certainly help with such understanding.…”
Section: Introductionmentioning
confidence: 99%