This paper describes the autofeat Python library, which provides a scikit-learn style linear regression model with automated feature engineering and selection capabilities. Complex non-linear machine learning models such as neural networks are in practice often difficult to train and even harder to explain to non-statisticians, who require transparent analysis results as a basis for important business decisions. While linear models are efficient and intuitive, they generally provide lower prediction accuracies. Our library provides a multi-step feature engineering and selection process, where first a large pool of non-linear features is generated, from which then a small and robust set of meaningful features is selected, which improve the prediction accuracy of a linear model while retaining its interpretability.
IC layouts are typically defined with simple shapes such as rectangles and 45° triangles. Fundamental limitations in the imaging process unavoidably prevent the exact rendering of these shapes on the wafer, and this necessitates an interpretation of what should appear on silicon. For example, an OPC tool must interpret a square corner as something more rounded, otherwise the pursuit of the ideal shape may lead to bridging and/or Mask Rule Check (MRC) violations. A solution to this is to move the target points for Optical Proximity Correction (OPC) off from the GDS edges and onto mathematically described curves inscribed within the corners of the design polygon and use these as the target for OPC correction. Suitable values for the radius of these curves depend on the model used, the geometry they are applied to, and the requirements of the device the shape builds. An uncorrected square corner gives a printed contour whose radius of curvature, nearest the design corner, provides a target radius for a low impact OPC correction. Line ends, right angled bends in tracks and end caps all need separate optimization in terms of the best radius of target curve to use. By understanding whether the design priority is for CD control (such as poly gate) or for positional accuracy (such as contact enclosure) the OPC correction parameters and final target shape can be modified in such a way to best realize these interpreted goals.
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