2023
DOI: 10.1088/1674-1056/ac90b5
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Review of a direct epitaxial approach to achieving micro–LEDs

Abstract: In this paper, a brief introduction of various studies on selective overgrowth for microLEDs is given first. Then a direct epitaxial approach to achieve microLEDs developed by our Sheffield team will be introduced. Advantages over conventional top-down method, namely dry etching method to form microLEDs are also discussed in details. At the end, limitations of such approach are briefly mentioned.

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Cited by 6 publications
(5 citation statements)
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“…To attempt to address the challenges mentioned above, the Sheffield team has developed a direct epitaxy approach which we call the CSE approach [97]. The CSE is different from homoepitaxy or heteroepitaxy or any conventional selective epitaxy.…”
Section: Advances In Science and Technology To Meet Challengesmentioning
confidence: 99%
See 1 more Smart Citation
“…To attempt to address the challenges mentioned above, the Sheffield team has developed a direct epitaxy approach which we call the CSE approach [97]. The CSE is different from homoepitaxy or heteroepitaxy or any conventional selective epitaxy.…”
Section: Advances In Science and Technology To Meet Challengesmentioning
confidence: 99%
“…To move forward, we believe the direct epitaxy method has to address (or solve) the following issues in the next 5 to 10 years [97]:…”
Section: Advances In Science and Technology To Meet Challengesmentioning
confidence: 99%
“…The quantum efficiency of small-size LEDs is considerably lower than that of large-size LEDs as a result of the dry etching process, which becomes a considerable problem when the LED size is ≤10 µm. A direct epitaxy method for µLEDs in which the dry etching technique used to form the µLED mesa is no longer required was conceived and developed by the Sheffield team and is called the “confined selective epitaxy” (CSE) approach [ 81 ]. Steady emission color, extremely high external quantum efficiency, reduced leakage current, improved indium integration to generate red emissions, and low parasitic capacitance are its many main benefits.…”
Section: Solution For Increasing Eqe Of µLedsmentioning
confidence: 99%
“…The ultrahigh yield requirement for RGB micro-LEDs and fabrication bottleneck for red micro-LEDs result in high cost, which hinders the development and application of full-color micro-LED displays 61,62 . An alternate method to achieve full-color displays is using QD-CCF technology; the patterning and morphology modification of QD-CCF help reduce optical crosstalk and improve the efficiency, resolution, and reliability of full-color micro-LED displays 63,64 . In this case, the fabrication of micro-LEDs includes the epitaxial growth of wafers, device preparation, defect detection, defect repair, mass transfer, and full-color displays, which should be improved to achieve the commercialization of micro-LED displays 65−71 .…”
Section: Overview Of Micro-led-based Full-color Displaysmentioning
confidence: 99%