2003
DOI: 10.1109/tns.2003.813197
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Review of displacement damage effects in silicon devices

Abstract: This paper provides a historical review of the literature on the effects of radiation-induced displacement damage in semiconductor materials and devices. Emphasis is placed on effects in technologically important bulk silicon and silicon devices. The primary goals are to provide a guide to displacement damage literature, to offer critical comments regarding that literature in an attempt to identify key findings, to describe how the understanding of displacement damage mechanisms and effects has evolved, and to… Show more

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Cited by 627 publications
(375 citation statements)
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References 148 publications
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“…4. Along with transient events, proton impacts produce permanent hot pixels due mainly to atomic displacements in the silicon lattice (Srour et al 2003;Hopkinson 1996). The intensity of a bright pixel is not stable in time.…”
Section: Saamentioning
confidence: 99%
“…4. Along with transient events, proton impacts produce permanent hot pixels due mainly to atomic displacements in the silicon lattice (Srour et al 2003;Hopkinson 1996). The intensity of a bright pixel is not stable in time.…”
Section: Saamentioning
confidence: 99%
“…Even under high energy irradiation, defect clusters which may degrade detector performance, usually referred to as "terminal subclusters," are produced when the recoil loses the last 5-10 keV of energy. 49 Periodic boundary conditions were applied only to Y and Z, but not to the implant direction X. SRIM 38 simulations were used to estimate the simulation cell size for each ion type and substrate material in order to avoid the self-overlapping of cascades. Simulations were done at 0 K to prevent dynamic annealing and to ensure that the results of the characterization of damage are not affected by other mechanisms related to thermal annealing.…”
Section: Implant Cascadesmentioning
confidence: 99%
“…NIEL is that part of the energy introduced via both elastic (coulombic and nuclear) and nuclear inelastic interactions that produce the initial vacancy interstitial pairs and phonons. 23 The Mean dark signal increase contribution is due to displacement damage dose (D d ). The D d is given by the particle fluence, , times NIEL, where the latter quantity is the rate at which non-ionzing energy is lost to the production of atomic displacements in a given material.…”
Section: A Mean Dark Signal Increasementioning
confidence: 99%