Review of scanning probe micromachining and its applications within nanoscience

Michels, Thomas; Rangelow, Ivo W.

doi:10.1016/j.mee.2014.02.011

Cited by 59 publications

(28 citation statements)

References 138 publications

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“…For a recent review of actuation and sensing schemes see ref. 119. At least three terminals are needed per cantilever to control read and write processes separately which poses an integration challenge for high numbers of parallel levers.…”

Section: Large Area Patterningmentioning

confidence: 99%

Advanced scanning probe lithography

2014

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The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning capabilities that are unmatched by other lithographic techniques. However, the limited throughput of scanning probe lithography has prevented their exploitation in technological applications. Here, we review the fundamentals of scanning probe lithography and its use in materials science and nanotechnology. We focus on the methods and processes that offer genuinely lithography capabilities such as those based on thermal effects, chemical reactions and voltage-induced processes. Published in:Nature Nanotechnology 9, 577-587 (2014) Progress in nanotechnology depends on the capability to fabricate, position, and interconnect nanometre-scale structures. A variety of materials and systems such as nanoparticles, nanowires, two-dimensional materials like graphene and transition metal dichalcogenides, plasmonics materials, conjugated polymers and organic semiconductors are finding applications in nanoelectronics, nanophotonics, organic electronics and biomedical applications. The success of many of the above applications relies on the existence of suitable nanolithography approaches. However, patterning materials with nanoscale features aimed at improving integration and device performance poses several challenges. The limitations of conventional lithography techniques related to resolution, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods [1][2][3] .Since the first patterning experiments performed with a scanning probe microscope in the late 80s, scanning probe lithography (SPL) has emerged as an alternative lithography for academic research that combines nanoscale feature-size, relatively low technological requirements and the ability to handle soft matter from small organic molecules to proteins and polymers. Scanning probe lithography experiments have provided striking examples of its capabilities such as the ability to pattern 3D structures with nanoscale features 4 , the fabrication of the smallest field-effect transistor 5 or the patterning of proteins with 10 nm feature size 6 . Figure 1a shows a general scheme of SPL operation. There is a variety of approaches to modify a material in a probe-surface interface which have generated several SPL methods. Scanning probe lithographies can be either classified by emphasizing the distinction between the general nature of the process, chemical versus physical, or by considering if SPL implies the removal or addition of material. However, we consider it is more inclusive and systematic to classify the different SPL methods in terms of the driving mechanisms used in the patterning process, namely thermal, electrical, mechanical and diffusive methods (Fig. 1b). Challenges in nanoscale lithographyThe workhorse of large volume CMOS fabrication, o...

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Section: Large Area Patterningmentioning

confidence: 99%

Advanced scanning probe lithography

2014

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“…The general development history of our active cantilever was presented already in 2014. 15 For high-speed AFM imaging, we follow the two approaches described earlier, i.e., optimizing the active cantilevers and the development of high-speed, large range nanopositioning stages with appropriate control. In this context, active cantilever with higher resonance frequency, higher bandwidth, and low spring constant will be presented.…”

Section: Introductionmentioning

confidence: 99%

“…Furthermore, it has been shown that, even with static thermal time constant of 30 ls, high resonance frequencies of up to 4 MHz can be addressed through thermomechanical actuation. 15 Thermal actuation, due to simple implementation and extraordinary dynamic behavior, is an excellent candidate for self-actuated high frequency cantilever sensors. Herein, the authors describe in this paper in more detail our efforts in the development of miniaturized active cantilevers.…”

Section: Introductionmentioning

confidence: 99%

Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

Rangelow

Ivanov

Ahmad

et al. 2017

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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With the recent advances in the field of nanotechnology, measurement and manipulation requirements at the nanoscale have become more stringent than ever before. In atomic force microscopy, high-speed performance alone is not sufficient without considerations of other aspects of the measurement task, such as the feature aspect ratio, required range, or acceptable probe-sample interaction forces. In this paper, the authors discuss these requirements and the research directions that provide the highest potential in meeting them. The authors elaborate on the efforts toward the downsizing of self-sensed and self-actuated probes as well as on upscaling by active cantilever arrays. The authors present the fabrication process of active probes along with the tip customizations carried out targeting specific application fields. As promising application in scope of nanofabrication, field emission scanning probe lithography is introduced. The authors further discuss their control and design approach. Here, microactuators, e.g., multilayer microcantilevers, and macroactuators, e.g., flexure scanners, are combined in order to simultaneously meet both the range and speed requirements of a new generation of scanning probe microscopes.

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“…Despite their individual and application-specific design most approaches make use of either membranes or cantilevers as functional key components. Furthermore, to increase the sensitivity, many MEMS devices are operated in resonance by applying either electro-magnetic, capacitive or piezoelectric elements for excitation [5].…”

Section: Introductionmentioning

confidence: 99%

Tuneable Q-Factor of MEMS Cantilevers with Integrated Piezoelectric Thin Films

Fischeneder

Oposich

Schneider

et al. 2017

Proceedings of Eurosensors 2017, Paris, France, 3–6 September 2017

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When targeting the integration of atomic force microscopes (AFM) into vacuum environments (e.g., scanning electron microscopes), a tunable Q-factor of the resonating AFM cantilever is a key feature to enable high speed measurements with high local resolution. To achieve this goal, an additional stimulus is applied to the cantilever with respect to the mechanical stimulus provided by the macroscopic piezoelectric actuator. This additional stimulus is generated by an aluminium nitride based piezoelectric actuator integrated on the cantilever, which is driven by a phase shifted excitation. With this approach, the mechanical Q-factor measured with a laser Doppler vibrometer (LDV) in vacuum is electrically decreased by a factor of up to 1.7.

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Review of scanning probe micromachining and its applications within nanoscience

Cited by 59 publications

References 138 publications

Advanced scanning probe lithography

Advanced scanning probe lithography

Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

Tuneable Q-Factor of MEMS Cantilevers with Integrated Piezoelectric Thin Films

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