2021
DOI: 10.3390/plasma4020022
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RF and Microwave Ion Sources Study at Institute of Modern Physics

Abstract: Intense ion beam production is of high importance for various versatile applications from accelerator injectors to secondary ion mass spectrometry (SIMS). For these purposes, different types of ion beams are needed and, accordingly, the optimum plasma to produce the desired ion beams. RF-type plasma features a simple structure, high plasma density and low plasma temperature, which is essential for negative ion beam production. A very compact RF-type ion source using a planar coil antenna has been developed at … Show more

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Cited by 8 publications
(2 citation statements)
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“…For the plasma equipment, with a molecular pump keeps the stable gas pressure in the working condition, the plasma power is of lower than 40 Watts and equipped with radio frequency (RF) ion source of 13.56 MHz. Indicating that the sample could be considered as a uniformly exposure of steady plasma environment 54 .…”
Section: Methodsmentioning
confidence: 99%
“…For the plasma equipment, with a molecular pump keeps the stable gas pressure in the working condition, the plasma power is of lower than 40 Watts and equipped with radio frequency (RF) ion source of 13.56 MHz. Indicating that the sample could be considered as a uniformly exposure of steady plasma environment 54 .…”
Section: Methodsmentioning
confidence: 99%
“…Electrode-less operation becomes particularly important in the case of plasma of corrosive gases such as oxygen. Currently, RF ion sources are widely used to produce high-intensity ion beams in laboratories around the world, such as CERN [4], IMP (China) [5], PSI (Switzerland) [6], SNS (U.S.) [7] etc. J-PARC (Japan) [8] is employing a solution featuring a LaB6 thermionic cathode in conjunction with an RF field to increase the beam current.…”
Section: Ion Sourcementioning
confidence: 99%