RF bias to suppress post-oxidation of μc-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna

Demolon, Pierre; Guittienne, Ph.; Howling, A.A.; Jost, S.; Jacquier, R.; Furno, I.

doi:10.1016/j.vacuum.2017.10.020

Cited by 2 publications

(2 citation statements)

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“…The results of this EM model are compared with experiments performed on a 1.2 1.2 ´m2 planar antenna which consists of an array of identical resonant circuit elements. When excited at one of its resonance frequencies, the RF resonant antenna develops very high currents within its structure, which can be used as an ICP source [19,[25][26][27][28][29]. Due to the spatially distributed resonant network, they are good candidates for large area plasma processing, with a particular advantage concerning impedance matching and power transfer efficiency because of their high and real input impedance.…”

Section: Existing Models Of Icp Sourcesmentioning

confidence: 99%

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Electromagnetic, complex image model of a large area RF resonant antenna as inductive plasma source

Guittienne¹,

Jacquier

Howling

et al. 2017

Plasma Sources Sci. Technol.

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A large area antenna generates a plasma by both inductive and capacitive coupling; it is an electromagnetically coupled plasma source. In this work, experiments on a large area planar RF antenna source are interpreted in terms of a multi-conductor transmission line coupled to the plasma. This electromagnetic treatment includes mutual inductive coupling using the complex image method, and capacitive matrix coupling between all elements of the resonant network and the plasma. The model reproduces antenna input impedance measurements, with and without plasma, on a 1.2 1.2 m 2 antenna used for large area plasma processing. Analytic expressions are given, and results are obtained by computation of the matrix solution. This method could be used to design planar inductive sources in general, by applying the termination impedances appropriate to each antenna type.

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Section: Existing Models Of Icp Sourcesmentioning

confidence: 99%

“…However, the peaks in figure 9(b) are due to the m=8 mode structure of the resonant antenna, not the individual legs. Note that low pressure ICP operation brings the advantage of no powder formation in deposition plasmas [29].…”

Section: Plasma Uniformitymentioning

confidence: 99%