2012
DOI: 10.4103/0377-2063.97329
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RF Compact Modeling of High-voltage MOSFETs

Abstract: The High-Voltage MOSFET is used in a wide variety of applications covering from power systems up to RF-IC. Compact models that describe the high-frequency behavior of the device are required to predict high-frequency operation and switching capabilities of these elements in HV state-of-the-art systems. In this paper, an RF model is presented and verified against extensive Y-parameter measurements, which were carried out on a long channel Lateral doubleDiffusion MOS device. Assessment of the model with measurem… Show more

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Cited by 9 publications
(6 citation statements)
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“…The EKV3 is an analytical compact MOSFET (metal oxide semiconductor field effect transistor) model that relies on MOSFET's physics -the charge sheet theory -to describe its behavior. EKV3 is a representant of the "charge-based" MOS transistor compact models [4], [5]. It first calculates the dependence of the mobile inversion charge density Q i on the voltages applied to the transistor.…”
Section: The Ekv3 Mosfet Modelmentioning
confidence: 99%
“…The EKV3 is an analytical compact MOSFET (metal oxide semiconductor field effect transistor) model that relies on MOSFET's physics -the charge sheet theory -to describe its behavior. EKV3 is a representant of the "charge-based" MOS transistor compact models [4], [5]. It first calculates the dependence of the mobile inversion charge density Q i on the voltages applied to the transistor.…”
Section: The Ekv3 Mosfet Modelmentioning
confidence: 99%
“…The usage of a bias-dependent resistance to model drift region offers fast convergency but fail to capture the physical phenomena that appear. This was addressed in [32,132] where a new full charge-based model for drift region of HV-MOSFETs was proposed. As mentioned above, a charge-based approach is applied both in the intrinsic part and the drift region.…”
Section: Lateral Non-uniform Doping Effectmentioning
confidence: 99%
“…The physics-based compact model proposed for drift region [32,132], considers this region as a simple one-dimensional problem, approach similar with charge-based LV model. It applies the charge sheet approximation and proves a linear relation between the charge in drift region and surface potential.…”
Section: Lateral Non-uniform Doping Effectmentioning
confidence: 99%
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