RF Magnetron Sputtering of Poly(propylene) in a Mixture of Argon and Nitrogen

Abstract

Poly(propylene) was RF sputtered in a working gas mixture of argon and nitrogen using planar magnetron. With nitrogen content in the mixture increasing from 0 to 100%, the deposition rate of plasma polymer films increased from 3 to 12 nm · min−1, the contact angle of water on sputtered plasma polymer films decreased from 62 to 37° and, according to FTIR measurements, the presence of NH and CN groups in these films increased. According to XPS, at 0% nitrogen in the working gas mixture the films contained more than 10 at.‐% of oxygen; with increasing content of nitrogen in the gas mixture this proportion steadily decreased whereas the nitrogen content in the film increased. When RF power was increased, the deposition rate and contact angle increased. Qualitative explanation of the deposition process is proposed.

Behavior of Polymeric Matrices Containing Silver Inclusions, 2 – Oxidative Aging of Nanocomposite Ag/C:H and Ag/C:H:O Films

“…These silver‐free C:H films were deposited using totally poisoned target (i.e., totally covered by carbonaceous film that prevents any silver emission) in the identical experimental arrangement as before. The absence of silver was confirmed by XPS and also supported by a typical FTIR spectrum 40, 41. (see also Part 129).…”

Deposition of Ag/a-C:H nanocomposite films with Ag surface enrichment

“…Nitrogen was chosen because plasma activated nitrogen species may induce the release of low‐molar‐mass volatile compounds upon their chemical interactions with the organic matrix . However, the kinetics of chemical reactions with silver is much slower at room temperature .…”

Amino‐rich Plasma Polymer Films Prepared by RF Magnetron Sputtering

“…In the first step, we deposited nitrogen‐rich plasma polymer film. It is known that sputtering of polymers in mixture of Ar and N 2 leads to the deposition of nitrogen rich films 16–18. Nitrogen content in the film increases with increasing concentration of nitrogen in the working gas while decreases with increasing power.…”

“…Although the possibility of using RF magnetron sputtering for nitrogen rich coating as well as for deposition of amino‐rich films has already been reported in the literature, no studies were done on the plasma post‐treatment of those films 16–18. The aim of this work was to test the capability of the post‐treatment to increase primary amine concentration on the nitrogen‐rich films and subsequently evaluate the ability of the treated films to adsorb proteins.…”